目的 改善商业钽箔作为钽阳极材料时比容量有限的问题。方法 提出了一种利用激光刻蚀技术和电化学腐蚀相结合的工艺在商业钽箔上构筑有序孔用于提升其储电能力的方法，对处理前后钽箔的表面形貌、结构特征以及电容性能发生的变化进行表征。结果 利用15 V的电压阳极氧化处理预先在钽箔表面生长一层Ta2O5，其具有的厚度更好地适应了1 064 nm激光的重复扫描。Ta2O5层在激光的作用下被有效去除，电子显微镜的表征结果显示，钽箔表面形成有序分布的阵列型微结构，为钽箔在电化学腐蚀过程中的孔生长提供了范围，这种独特的结构也为钽箔的电化学反应提供了更丰富的活性位点。比电容量的测试结果显示，有序孔钽箔在1 mol/L的H2SO4电解质溶液中具有247.4 nF/mm²的优异面积比容量，与未处理的商业钽箔21.7 nF/mm²的面积比容量相比提升了近11.4倍。结论 通过对商业钽箔进行特殊的孔结构设计，可以显著提升其作为电极时的比容量，利用激光刻蚀和电化学腐蚀的双重作用来控制钽箔上孔隙生长的有序性，有望为下一代钽电解电容器阳极材料的研究提供设计思路。

With the rapid development of science and technology, tantalum electrolytic capacitors have become indispensable micro-electronic components in aerospace, automatic control precision equipment, computers, and other high-end fields. However, tantalum capacitors have the characteristics of high capacitance, voltage resistance, oxidation resistance, low equivalent series resistance and sustainability, which are related to the structural characteristics of tantalum anode materials. At present, the preparation of tantalum anode materials with high specific surface area by the powder sintering process under high temperature (usually greater than 1 250 ℃) is a common means of industrial production, but the disordered pore structure generated during the preparation process causes the increase of defects inside the anode material, thereby reducing its specific capacity and voltage resistance characteristics. In addition, electrochemical corrosion technology has gradually become a common means for post-treatment of commercial tantalum foils, aiming to achieve extensive growth of micropores on the surface of tantalum foils, so as to improve the capacitance of tantalum foils. Due to the increase of the active site, the obtained porous tantalum can effectively promote the electrical storage reaction. However, this method is still porous uncontrolled, which is often not the ordered pore we need. Therefore, it is urgent to develop a simple and reliable method to improve the performance of tantalum anode materials by constructing ordered pores.