目的 在实验室自制的5 kW圆柱形单模微波等离子体化学气相沉积(MPCVD)装置上，系统研究各放电参数对等离子体的影响。方法 采用模拟计算与实验调控相结合的方式，分析微波等离子体、基团的运动和分布与放电参数之间的关系。利用发射光谱诊断等离子体环境，同时，利用SEM和Raman对所沉积的金刚石膜的形貌和质量进行表征，以验证MPCVD装置的调控原则。结果 气压和温度满足 关系时，吸收功率密度可达最大。单独提高微波功率和工作气压，能很大程度地增强等离子体的电子密度及改善等离子体球的均匀性，而两者相互之间匹配升高能极大地增加等离子体的电子密度，同时激发更多Hα、Hβ、CH及C2这类适合高质量金刚石膜沉积的活性基团。得到了MPCVD装置长时间稳定运行的等离子体稳定边界，并成功制备出高质量的金刚石膜。结论 功率气压及温度相匹配可以提高吸收功率密度、等离子体密度及均匀性。在圆柱形装置稳定运行的边界条件下，能沉积得到较高质量的金刚石膜。

This paper ains to systematically study the effects of discharge parameters on plasma in a 5 kW cylindrical single- mode microwave plasma chemical vapor deposition device. The relationship between the motion and distribution of microwave plasma and the discharge parameters was analyzed by means of simulation and experimental control. The plasma environment was diagnosed by way of the emission spectrum. Meanwhile, the morphology and quality of the diamond film deposited were characterized by SEM and Raman, so as to verify the regulation principle of MPCVD device. The experimental results showed