目的 研究不同沉积压力对磁控溅射La-Ti/WS2复合薄膜微观结构及摩擦学性能的影响。方法 采用非平衡射频磁控溅射法制备WS2薄膜和La-Ti/WS2复合薄膜。利用扫描电镜（SEM）和X射线衍射仪（XRD）对薄膜微观形貌、成分和晶向结构进行表征。用纳米压痕仪、摩擦磨损试验机和白光干涉三维形貌仪测试薄膜的力学性能和摩擦磨损性能。结果 掺杂La和Ti可以改善WS2复合薄膜的微观结构。在给定的沉积压力下，La-Ti/WS2复合薄膜均呈岛状生长模式，组织均匀，且排列较为紧凑，结构致密性好。随着沉积压力的增大，WS2(002)衍射峰向高θ值偏移，晶面间距减小，晶格发生收缩。复合薄膜的硬度和弹性模量随着沉积压力的增大，先增大后减小。沉积压力为1.2 Pa时，La-Ti/WS2复合薄膜的摩擦系数低至0.07左右，磨损率低至2.45×10–8 mm3/(N?m)。结论 沉积压力对La-Ti/WS2复合薄膜的性能有较大影响，合适的沉积压力可以提升La-Ti/WS2复合薄膜的摩擦磨损性能。

The work aims to research the effect of deposition pressure on the microstructure and tribological properties of La-Ti/WS2 composite films prepared by magnetron sputtering. La-Ti/WS2 composite films and WS2 films were prepared by unbalanced RF magnetron sputtering. Scanning electron microscopy (SEM) and X-ray diffraction (XRD) were used to characterize the microstructure, composition and crystal structure of the films. The mechanical properties and friction and wear properties of the films were tested by nano indentation, tribometer and white light interfering profilometer. The microstructure of WS2 composite films could be improved by doping La and Ti. The La-Ti/WS2 composite films showed island like growth mode under the given deposition pressure, and the structure was uniform and compact. With the increase of deposition pressure, the diffraction peak of WS2(002) shifted to a higher value of θ, the crystal surface spacing decreased, and the crystal lattice contracted. With the increase of deposition pressure, the hardness and elastic modulus of the composite films increased first and then decreased. When the deposition pressure was 1.2 Pa, the friction coefficient of La-Ti/WS2 composite film was as low as about 0.07, and the wear rate was as low as 2.45×10–8 mm3/(N?m). The deposition pressure has a great influence on the properties of La-Ti/WS2 composite films. Appropriate deposition pressure could improve the tribological properties of La-Ti/WS2 composite films.