目的 制备具备良好光催化性能的Cu2O/TiO2叠层复合薄膜。方法 利用直流磁控溅射技术（DMS）和能量过滤直流磁控溅射技术（EFMS）在玻璃基底上制备Cu2O/TiO2叠层复合薄膜，利用扫描电镜（SEM）、X射线衍射（XRD）、椭偏仪和光催化测试系统表征和分析了薄膜的表面形貌、结构、透射率和光催化性能。结果 DMS技术和EFMS技术制备的TiO2和Cu2O薄膜都有良好的结晶特性，其中TiO2为单一的锐钛矿结构。相对于DMS技术制备的Cu2O薄膜，EFMS样品中的Cu2O薄膜的衍射峰较弱，而且衍射峰的宽度变宽，衍射曲线比较平滑。薄膜表面较平整，颗粒均匀，较细小，边界明显。DMS和EFMS两种技术制备的薄膜的平均晶粒直径分别为15.4 nm和10.8 nm。透射光谱测试结果表明，EFMS技术制备的复合薄膜平均透射率较大，在350~800 nm范围内，平均透射率为0.388，DMS薄膜的值为0.343。对罗丹明B（RhB）的光催化降解结果表明，EFMS技术制备的薄膜的降解速率为-0.00411，大于DMS技术制备的薄膜的降解速率-0.00334。结论 EFMS技术制备的Cu2O/TiO2叠层复合薄膜对罗丹明B具有较大的光催化降解速率。

The work aims to prepare Cu2O/TiO2 multilayer composite thin films with good photocatalytic properties. The Cu2O/TiO2 multilayer composite thin films were fabricated on the glass substrates by the direct current magnetron sputtering (DMS) technique and energy filtering direct current magnetron sputtering (EFMS) technique. The surface morphology, structure, transmission and photocatalytic properties of the films were characterized and analyzed by Field Emission Scanning Electron Microscope (FESEM), X-ray Diffraction Spectrometer (XRD), ellipsometer and photocatalytic test system. Both TiO2 and Cu2O thin films prepared by DMS and EFMS techniques were well-crystallized, but TiO2 had single anatase phase. Compared with the Cu2O thin films fabricated by DMS technique, Cu2O samples prepared by the EFMS technique had weaker diffraction peaks. The width of the diffraction peaks became wider and the diffraction curve was smoother. The surfaces were flatter and consisted of smaller particles with obvious boundary. For the thin films prepared by the DMS and EFMS techniques, the average crystal grain diameter was 15.4 nm and 10.8 nm, respectively. From the transmission spectrum test results, the average transmittance of the composite films prepared by EFMS technique was larger, namely 0.388 in the range of 350 nm to 800 nm, and that of the films prepared by the former was 0.343. The results of photocatalytic degradation for RhB indicated that the degradation rate of the films prepared by EFMS technique was -0.00411, larger than that (-0.00334) of the films prepared by DMS technique. Cu2O/TiO2 multilayer composite thin films prepared by the EFMS technique have higher photocatalytic degradation rate on RhB.