目的 研究低基片转速对纳米多层膜微结构和性能的影响。方法 采用阴极多弧离子镀技术在单晶硅基片上沉积制备了MoTiAlN/MoN/Mo纳米复合结构涂层，借助X射线衍射仪（XRD）、扫描电镜（SEM）、透射电镜（TEM）、背散射谱（RBS）和纳米硬度计，分别对样品的物相、形貌、组分和硬度进行表征分析。结果 XRD显示不同转速下制备的涂层的物相结构主要为六角密排结构的MoN和面心立方(Ti,Al)N，较高基片转速下涂层的结晶性较好。SEM和TEM图像证实，2 r/min基片转速下的目标涂层具有平均调制周期26 nm的TiAlN/MoN超晶格结构，总厚度为1.15 μm，且界面清晰。纳米显微硬度测试表明，低基片转速下，涂层硬度和杨氏模量分别达到(30±2) GPa和(500±30) GPa。结论 不同能量的7Li2+离子卢瑟福背散射谱结合SIMNRA拟合程序，可定量评估该超晶格结构涂层的原子百分比、每个子层的物理厚度及调制周期，这为纳米多层膜的微结构表征提供了一种有效的分析手段。

The work aims to study the impact of low substrate rotation speed on microstructure and physical properties of nanostructured multilayer. MoTiAlN/MoN/Mo composite coatings were deposited on silicon substrates by cathodic multi-arc ion plating, and the phase structure, morphology, component and nanohardness of coatings species were characterized by X-ray diffraction, scanning electron microscopy, transmission electron microscopy, Rutherford backscattering spectroscopy and nano-hardness tester. XRD results indicated that the coatings deposited at various substrate rotation speeds comprised hcp-MoN and fcc-(Ti,Al)N phases and the crystallinity was better at higher substrate rotation speed. SEM and TEM images confirmed that the mean modulation period and total physical thickness of superlattice TiAlN/MoN coatings with a sharp interface deposited at 2 r/min were 26 nm and 1.15 μm, respectively and the interface was clear. The nanohardness and Young modulus were up to (30±2) GPa and (500±30) GPa, respectively. RBS along with SIMNRA program proves to be a good method to evaluate the atomic concentrations, physical thicknesses of individual sublayers as well as the modulation periods of superlattice coatings quantitatively and provide reliable characterization for nanomultilayers.