简单阐述了原子层沉积技术的发展背景，然后概括了原子层沉积技术原理、技术特征和优势，并对化学吸附和顺次反应两种自限制机制进行了描述和比较。着重介绍了原子层沉积技术在工艺等方面的最新成果，以及在纳米催化剂、电池、半导体器件、光学、生物医学和航空航天领域中的相关应用。其中将原子层沉积在电池、半导体器件和生物医学方面的应用进行了分类介绍。电池方面包括锂离子电池和太阳能电池，半导体器件方面分为高k电介质、电容器、电阻随机存取存储器（RRAM）和光、电二极管。生物医学领域分别介绍了其在生物相容性、抑菌抗菌涂层和微观组分方向的研究进展。最后对原子层沉积技术进行了归纳总结，并展望了其未来的发展方向和应用前景。

The development background of atomic layer deposition technology was briefly described. Then, technical principles, technical characteristics and advantages of atomic layer deposition technology were summarized, and the two self-limiting mechanisms of chemical adsorption and sequential reaction were described and compared. Hereafter, the latest results of the atomic layer deposition technology in process and other applications in nanocatalysts, batteries, semiconductor devices, optics, biomedicine and aerospace were highlighted. Among them, the applications of atomic layer deposition in batteries, semiconductor devices and biomedical applications were classified and introduced. The batteries included lithium ion batteries and solar cells. The semiconductor devices were divided into high-k dielectrics, capacitors, and resistor random access memory (RRAM), photodiode. In biomedical fields, the research progress in biocompatibility, antibacterial coatings and microscopic component directions were displayed, respectively. In the end, it summarized and prospected the development direction and application of atomic layer deposition technology.