化学计量学在新型十八胺复配缓蚀剂开发中的应用

刘凯, 王笑, 彭艳, 查方林, 王凌, 魏加强, 吴俊杰

表面技术 ›› 2018, Vol. 47 ›› Issue (2) : 202-207.

PDF(840 KB)
PDF(840 KB)
表面技术 ›› 2018, Vol. 47 ›› Issue (2) : 202-207. DOI: 10.16490/j.cnki.issn.1001-3660.2018.02.032
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化学计量学在新型十八胺复配缓蚀剂开发中的应用

  • 刘凯1, 查方林1, 王凌1, 魏加强1, 吴俊杰1, 王笑2, 彭艳2
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Application of Chemometrics in Development of New Octadecylamine Compound Inhibitor

  • LIU Kai1, ZHA Fang-lin1, WANG Ling1, WEI Jia-qiang1, WU Jun-jie1, WANG Xiao2, PENG Yan2
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摘要

目的 改善十八胺在低温下的成膜性能。方法 以吡啶和二异丙胺混合液为溶剂,添加辅助缓蚀剂进行复配。以pH、温度和各药剂的浓度为变量设计均匀试验,利用高压釜模拟发电厂水汽环境进行挂片实验,结合硫酸铜点滴试验和交流阻抗测试,评价试片的成膜效果。以膜电阻为定量评价指标,经化学计量学计算得到最优的复配配方。结果 最优复配配方为:十八胺50 mg/L,辅助缓蚀剂A、B、C、D质量浓度分别是45、30、25、30 mg/L,成膜pH=9.4,成膜时间3.5 h,成膜温度100~130 ℃。复配缓蚀剂成膜试片硫酸铜点滴试验初红时间达41 s,保护膜电阻值达82 420 Ω?cm2。结论 通过复配,有效改善了十八胺在100 ℃左右温度下的成膜效果,该配方可对停备用期间发电机组低温段设备提供有效的成膜保护。

Abstract

The work aims to improve film-forming property of octadecylamine at low temperature. With pyridine and diisopropylamine mixture as solvent, auxiliary inhibitors were added into the octadecylamine solution for complex formulation. Uniform experimental was designed by taking pH, temperature and concentrations of each medicament as variable. Coupon test was performed by simulating water-vapor environment of power plant with an autoclave. Film-forming effect of the coupons was evaluated by performing CuSO4 dripping test and AC impedance test. Optimal compounding formula was obtained based upon chemometric calculation with polarization impedance as quantitative evaluation index. Optimal formula was as follows: 50 mg/L octadecylamine, 45 mg/L auxiliary A, 30 mg/L auxiliary B, 25 mg/L auxiliary C and 30 mg/L auxiliary D, pH=9.4 and film-forming temperature 100~130 ℃. Initial reddening time of the compound inhibitor film-formed coupons in CuSO4 dripping test was 41 s, and resistance of the protective film was 82 420 Ω?cm2. Compound can effectively improve film-forming effects of octadecylamine at nearly 100 ℃, and the formula can provide effective film-forming protection for low temperature equipment during standby period of power unit.

关键词

复配缓蚀剂;十八胺;成膜;化学计量学;膜电阻;硫酸铜点滴;交流阻抗

Key words

compound inhibitor; octadecylamine; film formation; chemometrics; film resistance; CuSO4 dripping; AC impedance

引用本文

导出引用
刘凯, 王笑, 彭艳, 查方林, 王凌, 魏加强, 吴俊杰. 化学计量学在新型十八胺复配缓蚀剂开发中的应用[J]. 表面技术. 2018, 47(2): 202-207
LIU Kai, WANG Xiao, PENG Yan, ZHA Fang-lin, WANG Ling, WEI Jia-qiang, WU Jun-jie. Application of Chemometrics in Development of New Octadecylamine Compound Inhibitor[J]. Surface Technology. 2018, 47(2): 202-207

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