目的 采用高功率脉冲磁控溅射（HIPIMS）制备力学性能优良的氮化铬薄膜。方法 采用HIPIMS技术，利用铬靶及氩气、氮气，在不同峰值功率（52.44，91.52，138 kW ）下沉积了氮化铬薄膜。采用X射线衍射技术（XRD）、扫描电子显微镜（SEM）、纳米硬度计、摩擦磨损试验机、划痕仪等评价方法，研究了峰值功率对薄膜组织结构和力学性能的影响。结果 当峰值功率为52 kW时，靶材原子与离子的比值仅为5.4%，所生成氮化铬薄膜的晶粒尺寸较小，薄膜出现剥落的临界载荷为42 N，薄膜的磨损深度达到349 nm；当峰值功率提高到138 kW时，靶材原子与离子的比值为12.5%，在最大载荷100 N时，薄膜也未出现剥落，同时磨损深度仅为146 nm。结论 高的峰值功率能够提高靶材原子离化率和离子对基片的轰击效应，使氮化铬薄膜晶粒重结晶而长大，消除部分应力，使薄膜表现出优良的耐磨性和韧性，因此提高靶材峰值功率可以提高氮化铬薄膜的力学性能。

CrN films were deposited at different peak power (52.44, 91.52, 138 kW) by taking advantage of high power impulse magnetron sputtering (HIPIMS). The influence of peak power on structure and mechanical property of CrN films were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), nano-hardness tester, friction-abrasion testing machine and scratch tester. At lower peak power of 52 kW, the ion/atom ratio was only 5.4%. The fabricated CrN films were of small grain size, low critical load as 42 N and wearing depth as 349 nm. At higher peak power of 138 kW, the ion/atom ratio was 12.5%, no film pelt off at the maximum load of 100 N and wearing depth was only 146 nm. High peak power can improve atomic ionization rate and ion bombardment to substrate, so as to realize grain recrystallization and growth of CrN films, reduce certain stress and provide excellent wear resistance and toughness for films. Therefore, the increase of peak power of target can improve the mechanical property of deposited CrN films.