| ZHAO Dong-cai,QIU Jia-wen,XIAO Geng-jie,ZHANG Zi-yang.Application and Research Progress of Auxiliary Anode in Arc Ion and Magnetron Sputtering Deposition[J],51(11):174-185 |
| Application and Research Progress of Auxiliary Anode in Arc Ion and Magnetron Sputtering Deposition |
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| DOI：10.16490/j.cnki.issn.1001-3660.2022.11.015 |
| KeyWord:auxiliary anode arc ion plating magnetron sputtering ionization rate large particle filtration |
| Author | Institution |
| ZHAO Dong-cai |
Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry of Education, Anhui University of Technology, Anhui Maanshan , China |
| QIU Jia-wen |
China Academy of Space Technology, Beijing , China |
| XIAO Geng-jie |
Lanzhou Institute of Physics, Lanzhou , China |
| ZHANG Zi-yang |
Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry of Education, Anhui University of Technology, Anhui Maanshan , China |
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| Abstract: |
| Through arc ion plating and sputtering deposition equipment, it can load a specific electric field to provide conditions for gas ionization, and load a magnetic field not parallel to the direction of the electric field to make electrons move spirally along the direction of the magnetic field. Also, it can further increase the probability of gas ionization, which is an important method to obtain the desired film quality. The plasma is distributed between the anode and cathode. The magnetic field increases the ionization rate, but it will not change the overall transport direction of electrons and ions in the plasma. At this time, if a pair of anodes and cathodes are added in addition to the original anode and cathode, the transport of electrons and ions between the new anode and cathode will be increased, resulting in great changes in the plasma layout, It will have a significant impact on the movement direction of large particles in the plasma, and guide the plasma to complete the surface treatment of special workpiece for original inaccessible place. The method of adding anode and cathode is often called auxiliary anode technology because the cathode is often equipotential with the vacuum chamber. The location of the auxiliary anode can be divided into three types:1) it can attract electrons, increase the ionization rate, and reduce the deposition temperature when it is placed near the cathode. At the same time, if there are negatively charged ions, it will also be attracted to the anode. In arc ion plating technology, large particles have large collision cross section, which is easy to collide with electrons and be negatively charged, so large particles will be attracted by anode to achieve the purpose of large particle filtration. 2) The anode is arranged on the back of the substrate. In the process of attracting electrons to the anode, the ionization rate of process gas and sediment near the substrate will increase, and the positive ions will collide with the substrate under the guidance of negative bias, so as to activate the substrate or improve the quality of the film. 3) For special workpieces, such as coating on the inner wall of the tube, the arrangement of auxiliary anodes can improve the uniformity of plasma in the tube cavity, so as to increase the consistency of film thickness and quality. The addition of electric field can be realized by auxiliary anode, and the addition of auxiliary anode only needs to arrange anode with specific shape at specific position of vacuum chamber. Even though additional leads are needed, it only needs a flange port, which is very convenient. The positive voltage of the auxiliary anode is usually between zero and several hundred volts. If it is zero volts, it can be directly connected with the vacuum chamber. That is to say, a certain part of the vacuum chamber can be designed specifically to meet the requirements. Auxiliary anode technology has the characteristics of changing ion energy and direction, which can inhibit large particles and change the ion energy reaching the surface of the film. It is of great significance to improve the quality of the film and worth promoting. |
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