| LIU Fan,WENG Jun,WANG Jian-hua,ZHOU Cheng.Simulation and Control of Cylindrical Resonant MPCVD Device[J],50(4):184-190 |
| Simulation and Control of Cylindrical Resonant MPCVD Device |
| Received:April 30, 2020 Revised:August 04, 2020 |
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| DOI：10.16490/j.cnki.issn.1001-3660.2021.04.017 |
| KeyWord:microwave plasma chemical vapor deposition plasma diamond film |
| Author | Institution |
| LIU Fan |
Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province, Wuhan Institute of Technology, Wuhan , China |
| WENG Jun |
Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province, Wuhan Institute of Technology, Wuhan , China |
| WANG Jian-hua |
Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province, Wuhan Institute of Technology, Wuhan , China;Institute of Plasma Physics, Chinese Academy of Sciences, Hefei , China |
| ZHOU Cheng |
Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province, Wuhan Institute of Technology, Wuhan , China |
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| Abstract: |
| This paper ains to systematically study the effects of discharge parameters on plasma in a 5 kW cylindrical single- mode microwave plasma chemical vapor deposition device. The relationship between the motion and distribution of microwave plasma and the discharge parameters was analyzed by means of simulation and experimental control. The plasma environment was diagnosed by way of the emission spectrum. Meanwhile, the morphology and quality of the diamond film deposited were characterized by SEM and Raman, so as to verify the regulation principle of MPCVD device. The experimental results showed |
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