| LI Hong,LI Yu-ting,LIN Song-sheng,SHI Qian,GUO Chao-qian,SU Yi-fan,DAI Ming-jiang.Effect of Bias Voltage on Structure and Properties of Tetrahedral Amorphous Carbon Film[J],50(3):284-292 |
| Effect of Bias Voltage on Structure and Properties of Tetrahedral Amorphous Carbon Film |
| Received:June 23, 2020 Revised:February 06, 2021 |
| View Full Text View/Add Comment Download reader |
| DOI：10.16490/j.cnki.issn.1001-3660.2021.03.030 |
| KeyWord:tetrahedral amorphous carbon film bias voltage arc ion plating structure and property |
| Author | Institution |
| LI Hong |
The Key Lab of Guangdong for Modern Surface Engineering Technology, National Engineering Laboratory for Modern Materials Surface Engineering Technology, Institute of New Materials, Guangdong Academy of Sciences, Guangzhou , China |
| LI Yu-ting |
School of Material and Energy, Guangdong University of Technology, Guangzhou , China |
| LIN Song-sheng |
The Key Lab of Guangdong for Modern Surface Engineering Technology, National Engineering Laboratory for Modern Materials Surface Engineering Technology, Institute of New Materials, Guangdong Academy of Sciences, Guangzhou , China |
| SHI Qian |
The Key Lab of Guangdong for Modern Surface Engineering Technology, National Engineering Laboratory for Modern Materials Surface Engineering Technology, Institute of New Materials, Guangdong Academy of Sciences, Guangzhou , China |
| GUO Chao-qian |
The Key Lab of Guangdong for Modern Surface Engineering Technology, National Engineering Laboratory for Modern Materials Surface Engineering Technology, Institute of New Materials, Guangdong Academy of Sciences, Guangzhou , China |
| SU Yi-fan |
The Key Lab of Guangdong for Modern Surface Engineering Technology, National Engineering Laboratory for Modern Materials Surface Engineering Technology, Institute of New Materials, Guangdong Academy of Sciences, Guangzhou , China |
| DAI Ming-jiang |
The Key Lab of Guangdong for Modern Surface Engineering Technology, National Engineering Laboratory for Modern Materials Surface Engineering Technology, Institute of New Materials, Guangdong Academy of Sciences, Guangzhou , China |
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| Abstract: |
| To systematically study the influence of arc ion plating bias on the structure and performance of ta-C film, clarify the mechanism of bias on the structure and performance of ta-C film, and provide a certain theoretical basis for expanding the application of ta-C film. The bias voltage process of arc ion plating was changed to deposit ta-C monolayer on the surface of cemented carbide substrate. Field emission scanning electron microscopy (SEM) was used to characterize the surface and cross-sectional micro-morphology of ta-C film. Raman spectroscopy and X-ray electron energy spectroscopy (XPS) were used to characterize the phase structure of ta-C film. Using a scratch tester to measure the ta-C film binding force, a stress meter to test the residual stress of ta-C film, the indentation test and nano hardness tester to measure the toughness and hardness of ta-C film, and a friction and wear testing machine to test the friction and wear performance of ta-C film. As the bias voltage increased, the number of large-size carbon particles on the surface of the ta-C film gradually increased, and the number of small-sized carbon particles gradually decreased due to reverse sputtering. The hardness of the ta-C film, sp3 bond content and residual stress are now increased and then decreased, the bias voltage is −180 V. As the bias voltage is increased, the binding force of the ta-C film and the substrate first increases and then decreases, and the maximum value is reached when the bias voltage is −140 V. With the increase of bias voltage, the wear resistance first increases and then decreases, when the bias voltage is −140 V, the lowest wear rate is 1.39×10−7 mm3/(N.m). The incident energy of the ta-C film deposited on the substrate surface increases, the number of large particles on the surface gradually increases, the residual stress in the film layer increases, the hardness increases, and the wear resistance increases. As the bias voltage increases due to the reverse sputtering effect, the small-sized particles on the surface of the film layer gradually decrease, the degree of graphitization in the film layer increases, and the wear resistance of the ta-C film decreases. |
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