| ZHANG Fu-lin,WANG Xuan,SONG Kai-qiang,LI Zhong-sheng,CONG Da-long,HE Qing-bing.Research Status and Development of Chemical Vapor Deposition Tungsten Coating[J],49(9):141-148 |
| Research Status and Development of Chemical Vapor Deposition Tungsten Coating |
| Received:June 17, 2020 Revised:September 20, 2020 |
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| DOI：10.16490/j.cnki.issn.1001-3660.2020.09.015 |
| KeyWord:chemical vapor deposition tungsten coating microstructure radiation resistance abrasion and corrosion resistance high temperature protection |
| Author | Institution |
| ZHANG Fu-lin |
Southwest Institute of Technology and Engineering, Chongqing , China |
| WANG Xuan |
Southwest Institute of Technology and Engineering, Chongqing , China |
| SONG Kai-qiang |
Southwest Institute of Technology and Engineering, Chongqing , China |
| LI Zhong-sheng |
Southwest Institute of Technology and Engineering, Chongqing , China |
| CONG Da-long |
Southwest Institute of Technology and Engineering, Chongqing , China |
| HE Qing-bing |
Southwest Institute of Technology and Engineering, Chongqing , China |
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| Abstract: |
| Tungsten coating by chemical vapor deposition has the characteristics of simple process, high technological maturity, and excellent overall quality and is widely used in the fields of national defense, aerospace and nuclear industry. The principles and characteristics of chemical vapor deposition tungsten coating were introduced firstly and the research status of process and application of chemical vapor deposition tungsten coating was analyzed emphatically, including the microstructure control process and the application in the fields of radiation resistance, abrasion and corrosion resistance and high temperature protection. At the same time, the development of new chemical vapor deposition tungsten coating technology was prospected. The first is to solve the problems of the existing process that the reaction gas source and the reaction product have high toxicity, and to meet the development requirements of green environmental protection. The second is to solve the problems of high deposition temperature, low deposition rate, etc., so that the deposition high-efficiency and high-quality can be achieved on different substrates surface. The third is to solve the problems that the existing chemical vapor deposition tungsten coating only has a single structure and function, to meet the requirements of components for high performance and multi-function of tungsten coating. |
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