| LI Da-yu,DAI Shu-yu,ZHANG Yan-jun,ZHANG Xu,ZHANG Zhang.Research Progress for Regulation Mechanism of TiSiO Amorphous Structure Optical Films[J],47(12):83-91 |
| Research Progress for Regulation Mechanism of TiSiO Amorphous Structure Optical Films |
| Received:March 06, 2018 Revised:December 20, 2018 |
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| DOI：10.16490/j.cnki.issn.1001-3660.2018.12.012 |
| KeyWord:TiSiO amorphous structure optical films sol-gel physical vapour deposition chemical vapour deposition |
| Author | Institution |
| LI Da-yu |
School of Mechanical Engineering, Yangzhou University, Yangzhou , China |
| DAI Shu-yu |
School of Mechanical Engineering, Yangzhou University, Yangzhou , China |
| ZHANG Yan-jun |
School of Mechanical Engineering, Yangzhou University, Yangzhou , China |
| ZHANG Xu |
School of Mechanical Engineering, Yangzhou University, Yangzhou , China |
| ZHANG Zhang |
School of Mechanical Engineering, Yangzhou University, Yangzhou , China |
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| Abstract: |
| The preparation methods of TiSiO composite thin films mainly include sol-gel, physical vapour deposition, chemical vapour deposition processes, etc. However, the research concerning the regulation mechanism on the microstructures and optical constants for TiO2 doped with SiO2 under different growth conditions is still in the stage of exploration. The structural and optical properties of TiSiO films fabricated under different deposition conditions at home and abroad in recent years were summarized: TiSiO films prepared by sol-gel processes were mainly influenced by two parameters including sol system and heat treatment, and the general laws governing the structures and optical properties of TiSiO films mediated by sol systems and heat treatment processes were summarized respectively. The TiSiO films deposited by physical vapor deposition (PVD) methods including sputtering and evaporation were also studied, and the general rules governing the structures and optical properties of TiSiO films during the PVD processes were described. The TiSiO films grown by chemical vapor deposition (CVD) which consists of low (or atmospheric) pressure chemical vapor deposition and plasma enhanced chemical vapor deposition were investigated, and the general rules to control the structures and optical properties of these films by adjusting some important parameters in different CVD techniques were described. The intrinsic connections between the preparation methods and the regula-tion rules for TiSiO film structures and properties are summarized and the problems existing in the preparation of such thin films and the subsequent research directions are pointed out. |
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