| WANG Bo,WEI Shi-cheng,WANG Yu-jiang,GUO Lei,LIANG Yi,PAN Fu-sheng,XU Bin-shi.Titanium-oxide Thin Films Prepared by Magnetron Sputtering Method[J],47(8):257-264 |
| Titanium-oxide Thin Films Prepared by Magnetron Sputtering Method |
| Received:March 07, 2018 Revised:August 20, 2018 |
| View Full Text View/Add Comment Download reader |
| DOI：10.16490/j.cnki.issn.1001-3660.2018.08.035 |
| KeyWord:titanium-oxide film technological parameters magnetron sputtering microstructure rutile anatase properties |
| Author | Institution |
| WANG Bo |
1.National Key Laboratory for Remanufacturing, Academy of Armored Forces Engineering, Beijing , China |
| WEI Shi-cheng |
1.National Key Laboratory for Remanufacturing, Academy of Armored Forces Engineering, Beijing , China |
| WANG Yu-jiang |
1.National Key Laboratory for Remanufacturing, Academy of Armored Forces Engineering, Beijing , China |
| GUO Lei |
1.National Key Laboratory for Remanufacturing, Academy of Armored Forces Engineering, Beijing , China |
| LIANG Yi |
1.National Key Laboratory for Remanufacturing, Academy of Armored Forces Engineering, Beijing , China |
| PAN Fu-sheng |
2.School of Material Science and Engineering, Chongqing University, Chongqing , China |
| XU Bin-shi |
1.National Key Laboratory for Remanufacturing, Academy of Armored Forces Engineering, Beijing , China |
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| Abstract: |
| Magnetron sputtering technology presents obvious advantages in preparing TiO2 films due to its higher sputtering rate, better film-substrate adhesion, easier industrial processes applicable to mass-production-scale deposition. However, structure and properties of TiO2 films can be significantly affected by magnetron sputtering parameters. Nowadays, how to control and optimize the parameters to achieve high performance TiO2 has become current research focus. Therefore, this work provided an overview of structure features and physical property of TiO2 in different crystal forms, and working principle of preparing TiO2 by magnetron sputtering. It was indicated that sputtering power, sputtering pressure, sputtering time, deposition temperature, oxygen partial pressure, etc. in the process of film formation were main factors affecting structure and properties of the films. In addition, the work elaborated the laws of influence and function of the five above-mentioned technological parameters on deposition rate, film thickness, surface roughness, phase composition, and photo catalytic properties. Besides, other key influencing factors and influence law affecting the structure and properties of TiO2 were also introduced, such as law of influence of annealing temperature on film structural transformation, effects of metal and non-metal doping on film morphology and properties, and different sputtering target material characteristics and their effects on film formation process. Finally, future research difficulties in developing TiO2 films by magnetron sputtering were proposed, and future research fields of TiO2 films were predicted. |
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