HUANG Shi-ling,ZHANG Ying-jiu,YANG De-lin.Study of Electroless Plating Nickel on the Diamond[J],44(6):65-69,81
Study of Electroless Plating Nickel on the Diamond
Received:January 22, 2015  Revised:June 20, 2015
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DOI:10.16490/j.cnki.issn.1001-3660.2015.06.013
KeyWord:electroless plating nickel  diamond  plating time  gain ratio  coating morphology
        
AuthorInstitution
HUANG Shi-ling Zhengzhou University, Zhengzhou , China
ZHANG Ying-jiu Zhengzhou University, Zhengzhou , China
YANG De-lin Zhengzhou University, Zhengzhou , China
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Abstract:
      Objective To enhance the bonding strength between the diamond and the substrate. Methods The diamond was pretreated with a method of " degreasing—roughening—sensitizing activation—glue", and then surface was modified by electroless nickel plating on the diamond. The influence of different parameters on chemical plated nickel layer was studied by scanning electron microscopy and energy dispersive X-ray. Results The optimum technical parameters of nickel layer on the diamond about 10 microns: NiSO4·6H2O (main salt) 25 g/ L, hypophosphite 30 g/ L, lactic acid 15 g/ L, sodium acetate 15 g/ L, the stabilizer 20 mg/ L, brightener 1 g/ L, pH=5. 5, temperature 85 ℃. Conclusion Hypophosphite content, thiourea content, pH, and temperature may affects the plating time, the diamond coating weight gain ratio and morphology of chemical nickel. The diamond was coated complete uniform with the optimal parameters.
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