WANG Qing-cang,ZHANG Xiao-dong,SU Jian-xiu,ZHU Wei-biao,XI Qin-yang,ZHU Xin,PEI Sheng-hua.Experimental Study on Chemical Mechanical Lapping of SiC Single Crystal Wafer[J],44(4):137-140,146
Experimental Study on Chemical Mechanical Lapping of SiC Single Crystal Wafer
Received:October 28, 2014  Revised:April 20, 2015
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DOI:10.16490/j.cnki.issn.1001-3660.2015.04.025
KeyWord:chemical mechanical lapping  grinding liquid  SiC single crystal wafer  material removal rate  surface quality
                    
AuthorInstitution
WANG Qing-cang Electromechanie Engineering College, Southwest Petroleum University, Chengdu , China
ZHANG Xiao-dong Electromechanie Engineering College, Southwest Petroleum University, Chengdu , China
SU Jian-xiu Electromechanical Institute, Henan Institute of Science and Technology, Xinxiang , China
ZHU Wei-biao Electromechanie Engineering College, Southwest Petroleum University, Chengdu , China
XI Qin-yang Electromechanie Engineering College, Southwest Petroleum University, Chengdu , China
ZHU Xin Electromechanie Engineering College, Southwest Petroleum University, Chengdu , China
PEI Sheng-hua Electromechanie Engineering College, Ji'an Vocational & Technical College, Ji'an , China
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Abstract:
      Objective To increase the material removal rate of SiC single crystal wafer and improve the surface quality after processing. Methods Grinding fluid experiment was carried out,and the range method was used to get the optimal proportion of grinding fluid and the importance order of the influencing factors for the removal rate in the grinding fluid composition. Single factor tests were performed for the major influencing factors and their influences on the material removal rate were investigated. Results The weight of the grinding fluid was 50 g, and the optimal formula of the grinding fluid was: 9 g grind assistant agent, 7 g dispersing agent, 5 g thickening agent, 3 g lubricant, 3 g abrasive A and 5 g abrasive B, the other components were all blending agents. The particle size of abrasive A and abrasive B was both W28. Conclusion The main factor affecting the material removal rate was the particle size of abrasive. The larger the size, the higher the material removal rate.
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