| LI Hui-qin,CHEN Xiao-yong,WANG Cheng,MU Ji-liang,XU Zhuo,YANG Jie,CHOU Xiu-jian,XUE Chen-yang,LIU Jun.Progress in Application Research of Atomic Layer Deposition in Micro-nano Devices Field[J],44(2):60-67 |
| Progress in Application Research of Atomic Layer Deposition in Micro-nano Devices Field |
| Received:December 08, 2014 Revised:February 20, 2015 |
| View Full Text View/Add Comment Download reader |
| DOI：10.16490/j.cnki.issn.1001-3660.2015.02.012 |
| KeyWord:atomic layer deposition thin-film preparation technology high aspect-ratio structure nano-porous structure micro-nano structure devices |
| Author | Institution |
| LI Hui-qin |
1. Key Laboratory of Instrumentation Science & Dynamic Measurement Ministry of Education,North University of China, Taiyuan , China; 2. Key Laboratory of Science and Technology on Electronic Test & Measurement, North University of China, Taiyuan , China |
| CHEN Xiao-yong |
1. Key Laboratory of Instrumentation Science & Dynamic Measurement Ministry of Education,North University of China, Taiyuan , China; 2. Key Laboratory of Science and Technology on Electronic Test & Measurement, North University of China, Taiyuan , China |
| WANG Cheng |
1. Key Laboratory of Instrumentation Science & Dynamic Measurement Ministry of Education,North University of China, Taiyuan , China; 2. Key Laboratory of Science and Technology on Electronic Test & Measurement, North University of China, Taiyuan , China |
| MU Ji-liang |
1. Key Laboratory of Instrumentation Science & Dynamic Measurement Ministry of Education,North University of China, Taiyuan , China; 2. Key Laboratory of Science and Technology on Electronic Test & Measurement, North University of China, Taiyuan , China |
| XU Zhuo |
Key Laboratory of Instrumentation Science & Dynamic Measurement Ministry of Education,North University of China, Taiyuan , China; |
| YANG Jie |
Key Laboratory of Science and Technology on Electronic Test & Measurement, North University of China, Taiyuan , China |
| CHOU Xiu-jian |
1. Key Laboratory of Instrumentation Science & Dynamic Measurement Ministry of Education,North University of China, Taiyuan , China; 2. Key Laboratory of Science and Technology on Electronic Test & Measurement, North University of China, Taiyuan , China |
| XUE Chen-yang |
1. Key Laboratory of Instrumentation Science & Dynamic Measurement Ministry of Education,North University of China, Taiyuan , China; 2. Key Laboratory of Science and Technology on Electronic Test & Measurement, North University of China, Taiyuan , China |
| LIU Jun |
1. Key Laboratory of Instrumentation Science & Dynamic Measurement Ministry of Education,North University of China, Taiyuan , China; 2. Key Laboratory of Science and Technology on Electronic Test & Measurement, North University of China, Taiyuan , China |
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| Abstract: |
| Atomic layer deposition (ALD) is a new type of accurate surface thin film preparation technique, which has several characteristics such as depositing large-area uniform films, making the film thickness control at nanometer level feasible, and lower deposition temperature. This new technique is suitable for the complicated nano-porous and high aspect ratio substrate materials, and can be applied in the preparation of functional film materials for 3D micro-nano devices. Now great attention of widespread academic and industry has been paid to ALD technology. The development history and related working principles of ALD technology were reviewed in this paper. Especially, the application progress of ALD technique in the micro-nano devices, including semiconductor integrated circuit, micro and nano optics and biomedical field, was introduced in the paper. Meanwhile, the existing problems of ALD technique and its future development tendency were discussed. |
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