GAO Yong-chao,CHENG Hao,YANG Shu-ping,ZHUANG Wei-wei,CAI Yuan,ZHANG Guo-dong.Non-contact and Continuous Electrochemical Polishing of the Metal Strip[J],43(2):105-108,155
Non-contact and Continuous Electrochemical Polishing of the Metal Strip
Received:October 24, 2013  Revised:December 05, 2013
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KeyWord:non-contact  electrochemical polishing  process conditions  average roughnes
                 
AuthorInstitution
GAO Yong-chao Suzhou Advanced Material Research Institute, Suzhou , China
CHENG Hao Suzhou Advanced Material Research Institute, Suzhou , China
YANG Shu-ping Suzhou Advanced Material Research Institute, Suzhou , China
ZHUANG Wei-wei Suzhou Advanced Material Research Institute, Suzhou , China
CAI Yuan Suzhou Advanced Material Research Institute, Suzhou , China
ZHANG Guo-dong Suzhou Advanced Material Research Institute, Suzhou , China
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Abstract:
      Objective To develop a non-contact electrochemical polishing method which is suitable for producing continuous metal strip in industry. Methods Using environment friendly phosphoric acid-sulfuric acid as the main antioxidant electrochemical polishing solution, the influences of the anodic current density ( JA ) , the electrolyte temperature ( t ) , the distance between electrodes and metal strip( L) , the tape speed( v) on the surface roughness of the metal strip were studied, and the polishing process conditions were optimized. Results The optimized process conditions are as following: JA : 1500 ~ 2500 A / m2, t: 40 ~ 80 ℃ , L: 4 ~ 12 mm, v: 0. 5 ~ 1. 8 m / min. The results showed that the electrochemical polishing process could effectively reduce the surface roughness of the metal strip under the optimized conditions,the brightness of the polished tape could reach the mirror state, the average surface roughness Ra value was less than 1. 0 nm as tested by AFM around the 5 μmX5 μm micron. Conclusion The polishing process achieved the continuous polishing of metal strip at kilometer level and met the requirements for industrial production.
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