GAO Yong-chao,CHENG Hao,YANG Shu-ping,ZHUANG Wei-wei,CAI Yuan,ZHANG Guo-dong.Non-contact and Continuous Electrochemical Polishing of the Metal Strip[J],43(2):105-108,155 |
Non-contact and Continuous Electrochemical Polishing of the Metal Strip |
Received:October 24, 2013 Revised:December 05, 2013 |
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KeyWord:non-contact electrochemical polishing process conditions average roughnes |
Author | Institution |
GAO Yong-chao |
Suzhou Advanced Material Research Institute, Suzhou , China |
CHENG Hao |
Suzhou Advanced Material Research Institute, Suzhou , China |
YANG Shu-ping |
Suzhou Advanced Material Research Institute, Suzhou , China |
ZHUANG Wei-wei |
Suzhou Advanced Material Research Institute, Suzhou , China |
CAI Yuan |
Suzhou Advanced Material Research Institute, Suzhou , China |
ZHANG Guo-dong |
Suzhou Advanced Material Research Institute, Suzhou , China |
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Abstract: |
Objective To develop a non-contact electrochemical polishing method which is suitable for producing continuous metal strip in industry. Methods Using environment friendly phosphoric acid-sulfuric acid as the main antioxidant electrochemical polishing solution, the influences of the anodic current density ( JA ) , the electrolyte temperature ( t ) , the distance between electrodes and metal strip( L) , the tape speed( v) on the surface roughness of the metal strip were studied, and the polishing process conditions were optimized. Results The optimized process conditions are as following: JA : 1500 ~ 2500 A / m2, t: 40 ~ 80 ℃ , L: 4 ~ 12 mm, v: 0. 5 ~ 1. 8 m / min. The results showed that the electrochemical polishing process could effectively reduce the surface roughness of the metal strip under the optimized conditions,the brightness of the polished tape could reach the mirror state, the average surface roughness Ra value was less than 1. 0 nm as tested by AFM around the 5 μmX5 μm micron. Conclusion The polishing process achieved the continuous polishing of metal strip at kilometer level and met the requirements for industrial production. |
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