XU Xue-bo,HE Yao-hua,HE Zhi-yong,BAO Ming-dong.Pseudoelasticity Behavior of Ti-Ni Alloy Film Deposited Using Unbalanced Magnetron Sputtering[J],42(4):28-31
Pseudoelasticity Behavior of Ti-Ni Alloy Film Deposited Using Unbalanced Magnetron Sputtering
Received:March 21, 2013  Revised:April 10, 2013
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KeyWord:shape memory alloys  thin film  nanoindentation  pseudoelasticity
           
AuthorInstitution
XU Xue-bo Institute of Materials Engineering, Ningbo University of Technology, Ningbo , China
HE Yao-hua Institute of Materials Engineering, Ningbo University of Technology, Ningbo , China;Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan , China
HE Zhi-yong Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan , China
BAO Ming-dong Institute of Materials Engineering, Ningbo University of Technology, Ningbo , China
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Abstract:
      Five Ti-Ni shape memory alloy films with different composition were deposited using unbalanced magnetron sputter ion plating technique. As-deposited coatings were crystallized by heating to 600 益 at the environment of Ar insert gas.The phase transformation behavior of the fabricated film was investigated. The hardness and Young modulus of films were evaluated. The recoverable energy of films was investigated from the entire loading and unloading process that results into a load-displacement curve automatically. The effect of composition of films on hardness, elastic modulus and pseudoelasticity was discussed. Results indicated that hardness, Young爷 s modulus and pseudoelasticity increased with the rising of atomic percent of Ni in films. But there was a maximum value of those mechanic properties with the increase of Ni percent .
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