| DU Shan,HUANG Mei-dong,LIU Chun-wei,TANG Xiao-hong,LYU Chang-dong.Influence of Gas Flow Ratio of Oxygen and Argon on Structure and Optical Properties of Sputtered Vanadium Dioxide Thin Films[J],42(4):24-27 |
| Influence of Gas Flow Ratio of Oxygen and Argon on Structure and Optical Properties of Sputtered Vanadium Dioxide Thin Films |
| Received:February 18, 2013 Revised:March 07, 2013 |
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| KeyWord:vanadium oxides thin film oxygen flow argon flow reactive magnetron sputtering |
| Author | Institution |
| DU Shan |
College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin , China |
| HUANG Mei-dong |
College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin , China |
| LIU Chun-wei |
College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin , China |
| TANG Xiao-hong |
College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin , China |
| LYU Chang-dong |
College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin , China |
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| Abstract: |
| Vanadium dioxides ( VOx) films were fabricated by reactive r. f . magnetron sputtering technique. Deposition rate, phase structure, surface morphology and transmittance in visible range of the films were characterized. Influence of oxygen / argon flow ratio on structure and optical properties of the films was investigated at same deposition air pressure. Results show that the flow ratio can modify the microstructure of the films, as oxygen / argon flow ratio increases, deposition rate of the films decreases while granular size as well as transmittance of the films increases. |
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