XIAO You-jun,XU Yong-zhang.Study on the Additive for Electroless Copper Plating Taking the Potassium Sodium Tartrate as the Main Complexing Agent[J],(5):102-104,107
Study on the Additive for Electroless Copper Plating Taking the Potassium Sodium Tartrate as the Main Complexing Agent
Received:May 13, 2012  Revised:October 20, 2012
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KeyWord:potassium sodium tartrat  electroless copper plating  additive  deposition rate
     
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XIAO You-jun Jiangxi University of Science and Technology, Ganzhou , China
XU Yong-zhang Jiangxi University of Science and Technology, Ganzhou , China
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Abstract:
      It studied the additive for electroless copper plating taking potassium sodium tartrate as complexing agen, and discussed the effect of CH3OH,K4[Fe(CN)6]·3H2O,2,2'-bipyridine on the stability of plating bath, the quality of electroplating layer, the deposition rate of plating, to determine the amount of additive. The results indicate that the optimal conditions of the electroless copper plating system as follows: CH3OH is 14 ml/L,K4[Fe(CN)6]·3H2O is 30 mg/L,2,2'-bipyridine is 5 mg/L,plating 30 min in the bath, the copper deposition rate reaches 4.6 μm/h,electroplating layer appears shiny pale pink, and stability of plating bath is optimal, electroplating layer has good adhesion.
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