HE Jia-heng,CHEN Qi-ping,DANG Yu-feng,ZHONG Wen-bin,WANG Jing.Preparation of 238U Targets by Electro-deposition Method[J],39(6):80-83 |
Preparation of 238U Targets by Electro-deposition Method |
Received:March 26, 2010 Revised:December 10, 2010 |
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KeyWord:electro-deposition Uranium target |
Author | Institution |
HE Jia-heng |
Institute of Nuclear Physics and Chemistry,China Academy of Engineering Physics, Mianyang, , China |
CHEN Qi-ping |
Institute of Nuclear Physics and Chemistry,China Academy of Engineering Physics, Mianyang, , China |
DANG Yu-feng |
Institute of Nuclear Physics and Chemistry,China Academy of Engineering Physics, Mianyang, , China |
ZHONG Wen-bin |
Institute of Nuclear Physics and Chemistry,China Academy of Engineering Physics, Mianyang, , China |
WANG Jing |
Institute of Nuclear Physics and Chemistry,China Academy of Engineering Physics, Mianyang, , China |
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Abstract: |
In order to increase the amount of uranium target, simplify preparation process, electrodeposition method that widely used for preparation ofα nuclides target was used for preparation of uranium target. Preparation method of electro-deposition uranium targets was researched. Taking 0.15mol/ L ammonium oxalate as electrodeposion solution, the effect of base teatment process of stainless steel, current density, acidity, temperature, uranium ion concentration in plating solution on quality of electrodeposited layer was studied. The process parameters of preparation of uranium targets by electrodeposition were defined. The surface morphology,micro-zone component and structure of electrodeposited layer were analyzed and charactertized by infrared-ray spectrum, scanning electron microscope, and X-ray spectrum. The thickness of the uranium layers can reach 6 mg/cm2 by controlling the content of UO2(NO3)2in plaitng solution, at 60 mA/cm2, pH at 2~ 3, temperature at 60℃ , and(NH4)2C2O4quality concentration at 4~ 6 mg/mL. The spectrophotometry showed the electro-deposition layer was thin and adherent films with a yield near 98%. |
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