LIN Xiao-dong,SONG Xu-ding,FU Gao-sheng.Study on TiAlN Films Deposited by Composite Technology and Its Thermal Anti-oxidation Property[J],39(6):22-25
Study on TiAlN Films Deposited by Composite Technology and Its Thermal Anti-oxidation Property
Received:July 06, 2010  Revised:December 10, 2010
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KeyWord:TiAlN films  TiN films  thermal anti-oxidation property  intermediate frequency unbalanced magnetron sputtering  arc ion plating
        
AuthorInstitution
LIN Xiao-dong Fujian Communication Technology College, Fujian 35007, China
SONG Xu-ding Construction Machinery School, Chang'an University, Xi'an , China
FU Gao-sheng 1.Fujian Communication Technology College, Fujian 35007, China;2.The college of Mechanical Engineering, Fuzhou University, Fujian , China
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Abstract:
      The TiAlN and TiN films deposited on polished face of stainless steel by arc ion plating compounded with intermediate frequency unbalanced magnetron sputtering were oxidized at different temperature in heat treatment furnace. The investigation of microstruction, crystalline structure and micro-hardness after oxidant films was carried out. The experiment results show that the hardness of TiAlN films before and after oxidation increases with the enhance of Al target electric current density and the increase of Al content; The high temperature stability of TiAlN films superior to TiN films; The TiAlN films become expansion after800℃ oxidation. This will decrease the compactness of TiAlN films.
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