WANG Yuan-sheng,XIONG Ji,WANG Jun.Commercial-purity Titanium Hot-dip Aluminium and Its High Temperature Oxidation Resistance[J],39(6):4-7,12
Commercial-purity Titanium Hot-dip Aluminium and Its High Temperature Oxidation Resistance
Received:August 15, 2010  Revised:December 10, 2010
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KeyWord:hot-dip aluminum  commercial-purity titanium TA2  cyclic oxidation  oxidation resistance at high temperature
        
AuthorInstitution
WANG Yuan-sheng School of Manufacturing Science and Engineering, Sichuan University, Chengdu , China
XIONG Ji School of Manufacturing Science and Engineering, Sichuan University, Chengdu , China
WANG Jun School of Manufacturing Science and Engineering, Sichuan University, Chengdu , China
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Abstract:
      The microstructure and oxidation resistance at high temperature of commercial-purity titanium TA2 were analyzed by means of EDS,SEM,XRD and the cyclic oxidation test,TA2 was hot-dip aluminizing at 750℃ and then annealing at 950℃ for 6 h. The reason of TA2 hot dip aluminum has good oxidation resistance at high temperature was also discussed. The results show that TA2 hot dip aluminum layer divides into two layers, the intermediate layer and the outer layer, the intermediate layer major phase is Ti3Al, the outer layer can be further divided into inner diffusion layer and outer diffusion layer, the inner diffusion layer main is a compact Al2O3oxide film, and the outer diffusion layer is TiAl3and Al2O3.Moreover,after hot dipping aluminum, the oxidation resistance at high temperature of TA2 was im- proved clearly. The real reason why TA2 has pretty good oxidation resistance at high temperature is the formed Al2O3 oxide film at surface layer and inner diffusion layer.
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