| LI Wei-wei.New Method about Contaminants Removal for Storage Hard Disk after CMP[J],39(3):82-84 |
| New Method about Contaminants Removal for Storage Hard Disk after CMP |
| Received:December 24, 2009 Revised:June 10, 2010 |
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| DOI： |
| KeyWord:hard disk polyether CMP particle cleaning |
| Author | Institution |
| LI Wei-wei |
Hebei University of Technology, Tianjin , China |
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| Abstract: |
| Particle adsorption mechanism in the process of CMP has been put forwarded.The functions of wetting, dispersion, infiltration and sequestration, and the characteristics of polyether have been analyzed. Cleaner components have been confirmed by experiments, which can remove contaminants effectively and meet the requirement of hard disk processing. |
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