FU Yu-ting,BA Jun-zhou,JIANG Ya-xiong,YAN Fei-xue.A Method of Studying the Stability of Etching Solution[J],39(1):91-92,96 |
A Method of Studying the Stability of Etching Solution |
Received:August 21, 2009 Revised:February 10, 2010 |
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KeyWord:Chemic etching Etching solution Stability |
Author | Institution |
FU Yu-ting |
The 718th Research Institute of CSIC, Handan , China |
BA Jun-zhou |
The 718th Research Institute of CSIC, Handan , China |
JIANG Ya-xiong |
The 718th Research Institute of CSIC, Handan , China |
YAN Fei-xue |
The 718th Research Institute of CSIC, Handan , China |
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Abstract: |
In order to improve the effect of etching, it needed to study the stability of etching solution, and its method of studying was more important. Obtained the concentration of Ni2+ by ICP-AES, then obtained the weight of etched metal, studied the stability of three types of solution with different concentration, found the relations between etching rate and etched weight, as well as etching rate and etching time, then compared the both of them. It shows that the relations between etching rate and etched weight had superiority and is viable forevaluating the stability ofetching solution. Meanwhile, the stability of 1B42 is the best, and the solution's maximum of etched metal is more than 3 g/ L. |
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