FU Yu-ting,BA Jun-zhou,JIANG Ya-xiong,YAN Fei-xue.A Method of Studying the Stability of Etching Solution[J],39(1):91-92,96
A Method of Studying the Stability of Etching Solution
Received:August 21, 2009  Revised:February 10, 2010
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KeyWord:Chemic etching  Etching solution  Stability
           
AuthorInstitution
FU Yu-ting The 718th Research Institute of CSIC, Handan , China
BA Jun-zhou The 718th Research Institute of CSIC, Handan , China
JIANG Ya-xiong The 718th Research Institute of CSIC, Handan , China
YAN Fei-xue The 718th Research Institute of CSIC, Handan , China
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Abstract:
      In order to improve the effect of etching, it needed to study the stability of etching solution, and its method of studying was more important. Obtained the concentration of Ni2+ by ICP-AES, then obtained the weight of etched metal, studied the stability of three types of solution with different concentration, found the relations between etching rate and etched weight, as well as etching rate and etching time, then compared the both of them. It shows that the relations between etching rate and etched weight had superiority and is viable forevaluating the stability ofetching solution. Meanwhile, the stability of 1B42 is the best, and the solution's maximum of etched metal is more than 3 g/ L.
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