YANG Qiong,WANG Chuan-bin,ZHANG Song,ZHANG Dong-ming,SHEN Qiang,ZHANG Lian-meng.Effects of Deposition Temperature and Annealing on Structure of BCN Thin Films[J],39(1):63-66
Effects of Deposition Temperature and Annealing on Structure of BCN Thin Films
Received:September 18, 2009  Revised:February 10, 2010
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KeyWord:BCN thin films  Deposition temperature  Annealing  Pulsed laser deposition
                 
AuthorInstitution
YANG Qiong State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan , China
WANG Chuan-bin State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan , China
ZHANG Song State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan , China
ZHANG Dong-ming State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan , China
SHEN Qiang State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan , China
ZHANG Lian-meng State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology, Wuhan , China
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Abstract:
      BCN thin films were deposited on Si(100)substrates by pulsed laser deposition. The effects of deposition temperature and annealing on the film composition and structure were investigated.Fourier-transform infrared(FT-IR)spectroscopy and X-ray photoelectron spectroscopy(XPS)were used to characterize the BCN thin films. The results show that deposition temperatures have little influence on film composition. FTIR and XPS analyses indicated the as-deposited BCN films contained B— C, N— C and B— N chemical bonds with B— C— N atomic hybridization.BCN thin films which annealed in vacuum at 700℃ were stable.When annealed in air, the samples were oxidated. Meanwhile, the formation of C≡ N bond indicated that it has better thermal stability.
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