| GU Lin,WEI Xiao-wei.Hard Anodic Oxidation Technology for Cast ZL301 Alloy[J],37(3):55-57 |
| Hard Anodic Oxidation Technology for Cast ZL301 Alloy |
| Received:March 29, 2008 Revised:June 10, 2008 |
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| DOI： |
| KeyWord:Cast ZL301 alloy Hard anodic oxidation Oxide film |
| Author | Institution |
| GU Lin |
Department of Materials Science and Engineering, Xihua University, Chengdu , China |
| WEI Xiao-wei |
Department of Materials Science and Engineering, Xihua University, Chengdu , China |
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| Abstract: |
| The hard anodic oxidation coating of cast 21301 alloy was investigated in four different solutions with special apparatus. The relations between the oxide film and the hardness of films-forming voltages of the hard anodic films were discussed; the optimum technology method of ZL301 pulse anodic oxidation was obtained. After applying this technology method, the voltage of film is lower than others during the process of anodic oxidation. The film is smooth and compact. The thickness of film is greater than 60μm; the average Vickers hardness of films is equal or greater than 300HV. |
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