| MElfang,GONG Man-feng,LI Ling.Application and Technologic Progress of Sputtering for the SiC Coating[J],37(2):75-78 |
| Application and Technologic Progress of Sputtering for the SiC Coating |
| Received:October 17, 2007 Revised:April 10, 2008 |
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| DOI： |
| KeyWord:Sputtering SiC coating Progress |
| Author | Institution |
| MElfang |
Institute of Material Physics and Chemistry, Zhanjiang Normal College, Zhanjiang , China |
| GONG Man-feng |
1. Institute of Material Physics and Chemistry, Zhanjiang Normal College, Zhanjiang , China;2. National Key Laboratory of Thermostructure Composite Materials,Northwestem Polytechnical University, Xian , China |
| LI Ling |
Institute of Material Physics and Chemistry, Zhanjiang Normal College, Zhanjiang , China |
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| Abstract: |
| In recent years, the deposited technologies of SiC coatings have made great progress, which makes great development for the study of the property of SiC coatings , the new technology and the new property emerge continually. Comparing with the other technologies ( CVD and PIP) , the sputtering technology has many profits : the low deposited temperature, high adhesive strength and compaction, smooth surface, enhanced hardness, enhanced optics and electrics characteristic and soft-environmental, so it has been focused on depositing the SiC coatings more and more. The theory and deposited technology about several sputtering technologies were discussed; the sputtering-technologic progress, characteristic and application of SiC coatings were emphasized; and the developing foreground and the hotspots about the sputtering SiC coating were expected. |
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