| NONG Shang-bin,YU Li-hua,XU Jun-hua.Microstructure and Properties of Ti-Si-N Nano-composites Deposited by Magnetron Sputtering[J],37(2):45-49 |
| Microstructure and Properties of Ti-Si-N Nano-composites Deposited by Magnetron Sputtering |
| Received:November 22, 2007 Revised:April 10, 2008 |
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| DOI： |
| KeyWord:Magnetron sputtering Ti-Si-N films Microstructure Properties |
| Author | Institution |
| NONG Shang-bin |
Key Lab. of Advanced Welding Technology, School of Materials Science and Engineering,Jiangsu University of Science and Technology, Zhenjiang , China |
| YU Li-hua |
Key Lab. of Advanced Welding Technology, School of Materials Science and Engineering,Jiangsu University of Science and Technology, Zhenjiang , China |
| XU Jun-hua |
Key Lab. of Advanced Welding Technology, School of Materials Science and Engineering,Jiangsu University of Science and Technology, Zhenjiang , China |
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| Abstract: |
| A series of Ti-Si-N nano-composite thin films with different silicon content have been deposited by multi-target reactive magnetron sputtering in order to investigate the influence of silicon content on the microstructure and properties of thin films. The microstructure, mechanical properties and high temperature properties were studied with XRD, SEM and nanoindentation. The results show that it leads to grain refinement, hardness enhancement and improve- ment of high temperature properties as the Si content increases. The grain size decreases sharply as the silicon content increases at a silicon content of around 40-/o ~ 120-/o . The hardness remains at a high level at a Si content of 9% and above. The films show a high oxidation resistance at Si content of 7% and above. The mechanisms of hardness enhancement and improvement of oxidation resistance have been discussed. |
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