| WANG Bin,YAN Jun,DU Shi-guo,CUI Hai-ping.The Development of the Nanometer Ti02 Preparation at Low Temperature[J],36(6):66-69 |
| The Development of the Nanometer Ti02 Preparation at Low Temperature |
| Received:July 05, 2007 Revised:December 10, 2007 |
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| DOI： |
| KeyWord:Nanometer Ti02 Preparation at low temperature Tendency |
| Author | Institution |
| WANG Bin |
the 3rd Department of Ordnance Engineering College, Shijiazhuang , China |
| YAN Jun |
the 3rd Department of Ordnance Engineering College, Shijiazhuang , China |
| DU Shi-guo |
the 3rd Department of Ordnance Engineering College, Shijiazhuang , China |
| CUI Hai-ping |
Physics and Chemistry Section of Ordnance Engineering College, Shijiazhuang , China |
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| Abstract: |
| Titanium dioxide thin film as a kind of solely catalytic material has extensive application in several fields. However, the traditional preparation technology needs the high temperature sintering normally, this kind of film needs high temperature resistant base, which has restricted its scope of application. Additionally, the high temperature sintering makes crystal grain grow up easily; it is active to have restricted smooth photocatalysis. This article represents the method of preparing nanometer titanium dioxide at low temperature , and individually corresponding features and problems are analyzed. Existing state of the study, especially the main tendency in future is also described. |
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