| WU Hui-min,AI You-hong,WU Qiong.The Technical Study on Chromium Plating for Trivalent Chromium[J],36(1):62-64 |
| The Technical Study on Chromium Plating for Trivalent Chromium |
| Received:October 21, 2006 Revised:February 10, 2007 |
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| DOI： |
| KeyWord:Parameter Coating Trivalent chromium Electrodeposition |
| Author | Institution |
| WU Hui-min |
College of Chemistry and Chemical Industry, Hubei University, Wuhan , China |
| AI You-hong |
College of Chemistry and Chemical Industry, Hubei University, Wuhan , China |
| WU Qiong |
College of Chemistry and Chemical Industry, Hubei University, Wuhan , China |
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| Abstract: |
| The effects of technological and parameter,such as condition and pH value, temperature, stirring, current density and so on on coating were studied by little slot test and Hull Cell test. The study shows th-at: in the sulfate system, when the pH is close to two or three, current density is between 15～45 and the temperature is between 25～45, it can obtain qualified coatings. |
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