| LI Liqing,ZHANG Lixu,YANG Liqin,WU Xinyu,HUANG Shaoqing,HUANG Minxiao,WANG Jiachen,YU Rongxiang.Effect of Ethylene Glycol Monophenyl Ether on the Film Stripping Process of Sodium Hydroxide Alkaline System[J],54(8):145-155 |
| Effect of Ethylene Glycol Monophenyl Ether on the Film Stripping Process of Sodium Hydroxide Alkaline System |
| Received:June 21, 2024 Revised:November 01, 2024 |
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| DOI：10.16490/j.cnki.issn.1001-3660.2025.08.013 |
| KeyWord:printed circuit board film stripper photoresist dry film ethylene glycol monophenyl ether plating layer clamped film tin corrosion |
| Author | Institution |
| LI Liqing |
School of Chemistry and Chemical Engineering,Jiangxi Ganzhou , China ;Yichun Lithium New Energy Industry Research Institute, Jiangxi University of Science and Technology, Jiangxi Yichun , China;Jiangxi Ganzhou Key Laboratory of Applied Electrochemistry, Jiangxi Ganzhou , China |
| ZHANG Lixu |
School of Chemistry and Chemical Engineering,Jiangxi Ganzhou , China ;Yichun Lithium New Energy Industry Research Institute, Jiangxi University of Science and Technology, Jiangxi Yichun , China |
| YANG Liqin |
School of Information Engineering, Jiangxi University of Science and Technology, Jiangxi Ganzhou , China |
| WU Xinyu |
School of Chemistry and Chemical Engineering,Jiangxi Ganzhou , China |
| HUANG Shaoqing |
School of Chemistry and Chemical Engineering,Jiangxi Ganzhou , China |
| HUANG Minxiao |
School of Chemistry and Chemical Engineering,Jiangxi Ganzhou , China |
| WANG Jiachen |
School of Chemistry and Chemical Engineering,Jiangxi Ganzhou , China |
| YU Rongxiang |
Jiangxi Xin Feng Zheng Tian Wei Technology Co., Ltd., Jiangxi Ganzhou , China |
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| Abstract: |
| In the film stripping process of printed circuit boards, the use of NaOH to remove the photoresist dry film tends to corrode the coating, and it is very easy to leave a residual film on the board surface, and the flaking film fragments are too large to be easily filtered. In order to solve the aforementioned problems, the work aims to investigate the effect of EPH on the film removal effect of NaOH by film stripping experiments, and mainly examine several aspects of performance indexes, such as stripping time and film fragment size. The degree of corrosion of the tin coating on the surface of the plates in the film stripper is evaluated by immersion tests and electrochemical tests, the micromorphology of the tin coating surface is analyzed by scanning electron microscopy, and the mechanism of action of the film stripper is investigated by Fourier transform infrared (FTIR) spectroscopy. The results show that it is difficult to remove the photoresist dry film in the line plating layer when only NaOH is used for stripping film, and the addition of EPH will inhibit the stripping rate to a certain extent, but it can be improved by reducing the size of the film fragment to solve the problem of unclean film removal, and the film fragment size is affected by the concentration of EPH, stripping time and other factors. For the extent of corrosion of protective plating (tin plating) on the surface of the circuit in the film stripper, it can be seen from the results of immersion experiments and electrochemical experiments that, as the concentration of EPH in the film stripper increases, the amount of thickness loss of the tin plating decreases, the surface charge transfer resistance increases and the corrosion current density decreases. From the SEM images, it can be observed that the surface of the tin plating is mainly composed of cellular structure substances, and the surface of the tin plating shows an obvious dissolution phenomenon after only NaOH is used for removal, while the morphology and structure of the plating layer after film stripping do not change significantly after EPH is added to the film stripper. The infrared spectrum of the photoresist dry film exhibits characteristic absorption peaks of carboxyl and ester groups at wavelengths of 1 720 cm−1 and 1 244 cm−1, among others. This indicates that the photoresist dry film contains a large number of alkali-soluble functional groups. In comparison to the original photoresist dry film, the infrared spectrum of the film after the removal process displays a distinctive absorption peak of carboxylates at a wavelength of 1 567 cm−1, which indicates that hydrolysis reactions have occurred with respect to the carboxyl and ester groups within the photoresist dry film following the removal process. Therefore, when NaOH is used for film removal, the addition of EPH mitigates the problems associated with the excessive size of the film fragments and the lack of clean film removal. In addition, it reduces the degree of corrosion of the tin plating by the film stripper. The film stripper mainly degrades the alkali-soluble groups in the molecules of the photoresist dry film, causing the film to swell, thus achieving the stripping process. |
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