| WANG Qichen,HAO Xia,ZHAO Jingyi,WANG Wenzhi,DUAN Jiaqi,ZHAO Huifeng,LI Junge,JIANG Hong.High Transmittance Anti-glare High Aluminum Glass Prepared by Etching Method[J],53(4):184-192 |
| High Transmittance Anti-glare High Aluminum Glass Prepared by Etching Method |
| Received:December 30, 2022 Revised:May 06, 2023 |
| View Full Text View/Add Comment Download reader |
| DOI：10.16490/j.cnki.issn.1001-3660.2024.04.017 |
| KeyWord:chemical etching transmittance high aluminum glass meta-surface pit structure glass surface |
| Author | Institution |
| WANG Qichen |
Special Glass Key Lab of Hainan Province,State Key Laboratory of Marine Resource Utilization in South China Sea, Hainan University, Haikou , China |
| HAO Xia |
HNHT Special Glass Technology Co., Ltd., Hainan Chengmai , China |
| ZHAO Jingyi |
Special Glass Key Lab of Hainan Province,State Key Laboratory of Marine Resource Utilization in South China Sea, Hainan University, Haikou , China |
| WANG Wenzhi |
Special Glass Key Lab of Hainan Province,State Key Laboratory of Marine Resource Utilization in South China Sea, Hainan University, Haikou , China |
| DUAN Jiaqi |
Special Glass Key Lab of Hainan Province,State Key Laboratory of Marine Resource Utilization in South China Sea, Hainan University, Haikou , China |
| ZHAO Huifeng |
HNHT Special Glass Technology Co., Ltd., Hainan Chengmai , China |
| LI Junge |
HNHT Special Glass Technology Co., Ltd., Hainan Chengmai , China |
| JIANG Hong |
Special Glass Key Lab of Hainan Province,State Key Laboratory of Marine Resource Utilization in South China Sea, Hainan University, Haikou , China;HNHT Special Glass Technology Co., Ltd., Hainan Chengmai , China |
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| Abstract: |
| Chemical etching is a widely used surface treatment technique that can improve the optical properties of materials, such as transmittance, gloss, etc. In order to obtain high aluminum glass with high transmittance, the high aluminum glass was treated to get anti-glare and anti-reflection performance and the transmittance was improved by chemical etching. The samples were cleaned with surfactants, and then placed in a mixed solution of ultrapure water, ethanol and acetone and washed ultrasonically at 25 ℃ for 30 min and finally washed and dried with ultrapure water. The samples were then pickled in 2.3 mol/L HF solution and reacted at 25 ℃ for 10 min and removed and washed with ultrapure water. After drying, the pickled samples were placed in containers containing 0.1 mol/L H2SO4, 0.4 mol/L HCl, 0.02 mol/L Na2SiF6 solution and etched for different time. After the reaction at 25 ℃, the samples were taken out, washed with ultrapure water, and dried to obtain high aluminum glass with high transmittance. The glass surface was analyzed and studied by scanning electron microscopy (SEM), X-ray spectroscopy (EDS), atomic force microscopy (AFM), ultraviolet-visible near-infrared spectrophotometer and other instruments. The surface of the unetched high aluminium glass presented a smooth and neat form. After etching, the surface had meta-surface pit structure, which was mainly used to change the optical path. When the light entered the surface structure, part of the light after a limited number of reflections and refractions became part of the transmitted light, and this pit structure was also equivalent to adding a dielectric layer with a gradient refractive index between air and glass, thereby reducing reflectivity and increasing transmittance. When the etching time was 5 min, a relatively sparse etching pit with a diameter of about 1.0- 2.5 μm and a pit depth of about 600 nm appeared, with an average transmittance of 93.28% and an average reflectivity of 6.57%. With the extension of the etching time, the diameter of the etching pit gradually increased, the density gradually increased, and the etching pits began to contact each other. When the etching time reached 20 min, the diameter of the pit was about 2.5- 5.0 μm, the depth of the pit was about 927.2 nm, the average transmittance reached 95.95%, which was 4.13% higher than that of the original unetched glass sheet, and the average reflectivity reached 4.01%, which was 4.10% lower than that of the original unetched glass sheet. When the etching time reached 30 min, the etching pits contacted and fused with each other, the depth of the pits decreased after fusion, the glass surface gradually flattened, the diameter of the pits was about 3.5-7.0 μm, the depth of the pits was about 862.4 nm, the average transmittance reached 95.09%, and the average reflectivity reached 4.90%. The composition of the glass before and after etching is basically unchanged, and the hardness of the pencil reaches 9H, which can also verify that the etching method is a film layer formed by etching directly on the glass body, and the film layer is closely combined with the glass matrix, and the film layer strength is higher. Chemical etching can prepare large-area anti-reflective glass, and its application prospects are very broad. |
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