AN Jun-jie,WEI Qiu-ping,YE Wen-tao,ZHANG Long,BAO Sheng-you,LI Song-bo,YU Yang-lei,ZHOU Ke-chao,MA Li,YIN Deng-feng.High Quality Diamond Films Deposited on Surface Modified Cu Foams by Chemical Vapor Deposition Method[J],49(3):97-105
High Quality Diamond Films Deposited on Surface Modified Cu Foams by Chemical Vapor Deposition Method
Received:December 20, 2019  Revised:March 20, 2020
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DOI:10.16490/j.cnki.issn.1001-3660.2020.03.012
KeyWord:Cu foams  interlayer  interfacial bonding  HFCVD  diamond foams  thermal diffusion
                             
AuthorInstitution
AN Jun-jie a.School of Materials Science and Engineering, Central South University, Changsha , China
WEI Qiu-ping a.School of Materials Science and Engineering, b.State Key Laboratory of Powder Metallurgy, Central South University, Changsha , China
YE Wen-tao a.School of Materials Science and Engineering, Central South University, Changsha , China
ZHANG Long b.State Key Laboratory of Powder Metallurgy, Central South University, Changsha , China
BAO Sheng-you a.School of Materials Science and Engineering, Central South University, Changsha , China
LI Song-bo a.School of Materials Science and Engineering, Central South University, Changsha , China
YU Yang-lei a.School of Materials Science and Engineering, Central South University, Changsha , China
ZHOU Ke-chao b.State Key Laboratory of Powder Metallurgy, Central South University, Changsha , China
MA Li b.State Key Laboratory of Powder Metallurgy, Central South University, Changsha , China
YIN Deng-feng a.School of Materials Science and Engineering, Central South University, Changsha , China
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Abstract:
      The work aims to select suitable interlayers to improve the bonding between the three-dimensional connected Cu foams and diamond, thereby preparing three-dimensional connected diamond foams. The three-dimensional connected Cu foams were selected as the template for the preparation of diamond foams. Ti and Cr interlayers were deposited on the surface of Cu foams by magnetron sputtering, and then the diamond films were deposited by hot filament chemical vapor deposition (HFCVD). The morphology, structure and thermal diffusion performance were measured by scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), Raman spectroscopy, X-ray diffraction (XRD) and infrared thermal imaging camera. The continuous diamond films are deposited on the Cu foams successfully after coating Cr and Ti interlayers. Under the same CVD deposition paraments, the Cr-modified Cu/Diamond (Cu-Cr/Dia) have larger grain size (5 μm), higher diamond quality and thicker diamond films compared with Ti-modified Cu/Diamond (Cu-Ti/Dia). The interfacial bonding between diamond and copper substrate of Cu-Ti/Dia samples are better than that of Cr-modified samples. And the thermal diffusion properties of Cu-Cr/Dia and Cu-Ti/Dia samples are both better than Cu foam. Cu-Cr/Dia samples have a slightly faster thermal responding than Cu-Ti/Dia samples. The introduction of Cr and Ti interlayers could effectively enhance the interfacial bonding between diamond and Cu foams, thereby the three-dimensional connected diamond foams were prepared successfully, which have potential applications in thermal management, water treatment, electrochemical sensing and other fields.
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