| LI De-yu,ZHAO Zi-wei,KONG De-long,LI Ning,WU Gang.Application of Hull Cell for High-speed Tin Plating Solution[J],47(11):239-244 |
| Application of Hull Cell for High-speed Tin Plating Solution |
| Received:July 28, 2018 Revised:November 20, 2018 |
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| DOI：10.16490/j.cnki.issn.1001-3660.2018.11.034 |
| KeyWord:high-speed Plating hull cell MSA tin plating current efficiency limiting current density |
| Author | Institution |
| LI De-yu |
1.School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Heilongjiang , China |
| ZHAO Zi-wei |
1.School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Heilongjiang , China |
| KONG De-long |
1.School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Heilongjiang , China |
| LI Ning |
1.School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Heilongjiang , China |
| WU Gang |
2.Department of Chemical and Biological Engineering, University at Buffalo, The State University of New York, Buffalo, New York 14260, USA |
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| Abstract: |
| To conveniently and quickly study the process of high-speed electroplating tin and apply Hull cell in high-speed tin plating liquid. A high-speed Hull cell device was designed experimentally to study the high-speed tin plating process conditions (temperature, current density, and flow rate) of MSA. The weighing method was used to test the current efficiency of bath at different current densities. The microstructure and crystal orientation of the coating were analyzed by scanning electron microscopy and X-ray diffractometry. With the increase of the flow rate of MSA electrolyzed electrolyte, the working current density was increased to 40 A/dm2, and the current efficiency was still over 90%; the electroplating process of MSA high-speed tin plating was: flow rate >146 cm/s, temperature 40~60 ℃, the current density was 20~40 A/dm2. The experimental results show that there was a positive relationship between the flow rate of the plating solution in the plate electrode and the limiting current density of the cathode, which was similar to the limiting diffusion current density formula of the rotating disk electrode. The XRD data of the same thickness tin deposition deposited at high speed can be obtained. With the increase of deposition current density, the preferred orientation of the crystal plane of the coating was changed from the (220) plane to the (321) plane. Compared with the effect of electroplating process on bath performance in a static Hull cell test, the design can better reflect the situation of actual production, and be applied to electroplating test and quality management of factory production. |
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