| WANG Xu,ZHANG Fan,ZHU He-fan,PAN Hong-liang.Influence of Temperature and Diffusion Time on Manufacturing Procedure of High Silicon Steel by CVD Method[J],42(1):85-87 |
| Influence of Temperature and Diffusion Time on Manufacturing Procedure of High Silicon Steel by CVD Method |
| Received:September 27, 2012 Revised:October 12, 2012 |
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| DOI： |
| KeyWord:6 . 5 % silicon steel CVD temperature diffusion time |
| Author | Institution |
| WANG Xu |
East China University of Science and Technology, Shanghai , China |
| ZHANG Fan |
University of Saskatchewan, Saskatoon S7 H2 Z4 , Canada |
| ZHU He-fan |
East China University of Science and Technology, Shanghai , China |
| PAN Hong-liang |
East China University of Science and Technology, Shanghai , China |
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| Abstract: |
| 6 . 5 % Si high silicon steel was manufactured by using CVD method and the process was introduced, the influence of temperature on the siliconizing rate and quality reducing rate, diffusion time on silicon distribution were investigated.Results as follows: the siliconizing rate will increase quickly when the temperature is higher than 1050 ℃ ,but the siliconizing rate will become steadily as the temperature up to 1200 ℃ ; The quality reducing rate will increase with the elevating of temperature and the rate will become steadily when the temperature is higher than 1200 ℃ ; The silicon will be well-distributed as the diffusion time is very sufficient, but it will be the highest efficient time when the Δw表-中/ b≤5 . |
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