WAN Xiao-bo,XING Pi-feng,YI Tai-min,YANG Meng-sheng,ZHENG Feng-cheng,XU Dao-jin,WANG Kun-shu,LOU Jian-she,KONG Ze-bin,ZHU Wei-ming.Effects of Working Pressure on Mo Films by Direct Current Magnetron Sputtering[J],42(1):71-74 |
Effects of Working Pressure on Mo Films by Direct Current Magnetron Sputtering |
Received:August 27, 2012 Revised:October 22, 2012 |
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KeyWord:molybdenum films direct current magnetron sputtering working pressure grain size microstrain |
Author | Institution |
WAN Xiao-bo |
Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang , China |
XING Pi-feng |
Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang , China |
YI Tai-min |
Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang , China |
YANG Meng-sheng |
Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang , China |
ZHENG Feng-cheng |
Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang , China |
XU Dao-jin |
Shanghai Research Institute of Precision Measuring and Testing, Shanghai , China |
WANG Kun-shu |
Shanghai Research Institute of Precision Measuring and Testing, Shanghai , China |
LOU Jian-she |
Shanghai Research Institute of Precision Measuring and Testing, Shanghai , China |
KONG Ze-bin |
Shanghai Research Institute of Precision Measuring and Testing, Shanghai , China |
ZHU Wei-ming |
Shanghai Research Institute of Precision Measuring and Testing, Shanghai , China |
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Abstract: |
Mo films were successfully deposited by DC magnetron sputtering on Si substrates. The influences of deposition rate, surface tomograph and microstructure were analyzed. The results show that deposition rate increases with pressure.The film sputtered at low pressure has good crystallization and exhibites dense structure. Under high pressure conditions, the film exhibites bad crystallization and loose structure. At the pressure of 0 . 8 Pa, the film has lowest value of crysize and microstrain. |
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