WAN Xiao-bo,XING Pi-feng,YI Tai-min,YANG Meng-sheng,ZHENG Feng-cheng,XU Dao-jin,WANG Kun-shu,LOU Jian-she,KONG Ze-bin,ZHU Wei-ming.Effects of Working Pressure on Mo Films by Direct Current Magnetron Sputtering[J],42(1):71-74
Effects of Working Pressure on Mo Films by Direct Current Magnetron Sputtering
Received:August 27, 2012  Revised:October 22, 2012
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KeyWord:molybdenum films  direct current magnetron sputtering  working pressure  grain size  microstrain
                             
AuthorInstitution
WAN Xiao-bo Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang , China
XING Pi-feng Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang , China
YI Tai-min Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang , China
YANG Meng-sheng Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang , China
ZHENG Feng-cheng Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang , China
XU Dao-jin Shanghai Research Institute of Precision Measuring and Testing, Shanghai , China
WANG Kun-shu Shanghai Research Institute of Precision Measuring and Testing, Shanghai , China
LOU Jian-she Shanghai Research Institute of Precision Measuring and Testing, Shanghai , China
KONG Ze-bin Shanghai Research Institute of Precision Measuring and Testing, Shanghai , China
ZHU Wei-ming Shanghai Research Institute of Precision Measuring and Testing, Shanghai , China
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Abstract:
      Mo films were successfully deposited by DC magnetron sputtering on Si substrates. The influences of deposition rate, surface tomograph and microstructure were analyzed. The results show that deposition rate increases with pressure.The film sputtered at low pressure has good crystallization and exhibites dense structure. Under high pressure conditions, the film exhibites bad crystallization and loose structure. At the pressure of 0 . 8 Pa, the film has lowest value of crysize and microstrain.
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