| LIU Heng,XIONG Yu-qing,WANG Ji-zhou.Analysis of Aluminum Deposition on Inner Wall of Pipes with Atomic Layer Deposition[J],(3):47-50 |
| Analysis of Aluminum Deposition on Inner Wall of Pipes with Atomic Layer Deposition |
| Received:January 09, 2012 Revised:June 20, 2012 |
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| DOI： |
| KeyWord:atomic layer deposition inner wall waveguide aluminum |
| Author | Institution |
| LIU Heng |
Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, Lanzhou , China |
| XIONG Yu-qing |
Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, Lanzhou , China |
| WANG Ji-zhou |
Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, Lanzhou , China |
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| Abstract: |
| The feasibility of aluminum deposition on inner wall of waveguide by atomic layer deposition was studied. First, by solving adsorption kinetics equation based on gas on the pipe inner wall, the time for the reactant to reach saturated adsorption on the basis was calculated. Then, according to the aluminum crystal structure, the thickness of each deposition cycle was obtained. Finally, the minimum aluminum thickness and number of atomic layer deposition cycles that can meet electromagnetic requirement of wave guide was calculated. |
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