| WU Chun,LIU Xiang-xuan,JIANG Da-yong,LIANG Jian-tao,WU You-peng.Preparation of Metal Cu Film and the Research of the Infrared Emissivity Properties[J],39(2):34-37 |
| Preparation of Metal Cu Film and the Research of the Infrared Emissivity Properties |
| Received:November 19, 2009 Revised:April 10, 2010 |
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| DOI： |
| KeyWord:Cu film electroless plating resistivity infrared emissivity |
| Author | Institution |
| WU Chun |
The Second Artillery Engineering Institute of Xi'an, Xi'an , China |
| LIU Xiang-xuan |
The Second Artillery Engineering Institute of Xi'an, Xi'an , China |
| JIANG Da-yong |
The Second Artillery Engineering Institute of Xi'an, Xi'an , China |
| LIANG Jian-tao |
The Second Artillery Engineering Institute of Xi'an, Xi'an , China |
| WU You-peng |
The Second Artillery Engineering Institute of Xi'an, Xi'an , China |
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| Abstract: |
| Metal Cu films were prepared on plate glass by an electroless plating technique with sodium hypophosphite as a reducing agent. The morphologies of surface, crystalline structure and optoelectronic properties were characterized by SEM, XRD, four-point probe resistance test system and infrared spectrum radiometer. The resent paper paid more attention to study the change relation ofinfrared emissivity and resistivity of metalCu films as well as the wavelength,and also has been compared with the classics Hagen-Ruben' s relation. The result indicates that the emissivity of Cu film reduces along with enlarging of wavelength, at the special band, the emissivity increases along with increasing of resistivity. |
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