| WANG Ying-nan,HANG Ling-xia,HU Min-da.Super Smooth Surface Fabrication Processes-plasma Etching[J],37(1):51-53 |
| Super Smooth Surface Fabrication Processes-plasma Etching |
| Received:October 23, 2007 Revised:February 10, 2008 |
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| DOI： |
| KeyWord:Super smooth surface Plasma polishing Capacitivcly-coupled discharge Roughness of surface Remove rate |
| Author | Institution |
| WANG Ying-nan |
Thin Film Technology and Optical Test Open Key Laboratory, Xian Technological University, Xian , China |
| HANG Ling-xia |
Thin Film Technology and Optical Test Open Key Laboratory, Xian Technological University, Xian , China |
| HU Min-da |
Thin Film Technology and Optical Test Open Key Laboratory, Xian Technological University, Xian , China |
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| Abstract: |
| A novel super smooth surface fabrication technology of plasma polishing was introduced. Progress and the mechanism of etching in the development of plasma etching processes were reviewed. Plasma polishing on designed plasma technology stage,the parameters that affect the etching results were studied by experiment, the optimal technological parameters were obtained. |
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