| SHOU Sha.Analysis of Influence Factors of Dip-pen Nanolithography[J],36(2):6-8,11 |
| Analysis of Influence Factors of Dip-pen Nanolithography |
| Received:November 27, 2006 Revised:April 10, 2007 |
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| DOI： |
| KeyWord:Dip-pen nanolithography Atomic force microscopy Nanostructure Lithography |
| Author | Institution |
| SHOU Sha |
Zhejiang Normal University , Jinhua , China |
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| Abstract: |
| Dip-pen nanolithography is a new scanning probe lithography ( SPL) technique based on atomic force miroscopy ( AFM) , and now have made a great progress. DPN directly transfers 6'1iquid ink" to substrate by water meniscus in order to form nanostructures. The line width of nanostructures is influenced by many factors such as tip curvature radius, detained time in the base surface, scanning speed, humidity, surface roughness etc. The time of tip end relation being held up in the face of the substitute and round radius square outside are ready-made a function. The line relaxes with tip end radius enhancing but is changed into width, scanning speed and the line broad become inverse relation, by the fact that the molecule controlling humidity being able to control ink changing speed, affecting the line width of nanostructur, thereby. The line broad increases and is changed into width with sample surface roughness. |
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