李禹静,杨凯军,朱锦鹏,庆宇斌,李庆奎,孙本双,何季麟.等离子喷涂制备靶材的研究进展[J].表面技术,2023,52(8):104-115.
LI Yu-jing,YANG Kai-jun,ZHU Jin-peng,QING Yu-bin,LI Qing-kui,SUN Ben-shuang,HE Ji-lin.Research Progress of Target Preparation by Plasma Spraying[J].Surface Technology,2023,52(8):104-115 |
| 等离子喷涂制备靶材的研究进展 |
| Research Progress of Target Preparation by Plasma Spraying |
| 投稿时间：2022-04-18 修订日期：2022-09-08 |
| DOI：10.16490/j.cnki.issn.1001-3660.2023.08.006 |
| 中文关键词: 靶材 等离子喷涂 高利用率 残靶修复 大尺寸 管状靶 |
| 英文关键词:target material plasma spraying high utilization rate residual target repairing large size tubular target |
| 基金项目:河南省高等学校重点科研项目(20A430025); 资源材料省部共建协同创新中心开放基金(zycl202002) |
| 作者 | 单位 |
| 李禹静 | 郑州大学 河南省资源与材料工业技术研究院, 郑州 450001;郑州大学 中原关键金属实验室, 郑州 450001 |
| 杨凯军 | 郑州大学 河南省资源与材料工业技术研究院, 郑州 450001;郑州大学 中原关键金属实验室, 郑州 450001 ;郑州大学 材料科学与工程学院, 郑州 450001 |
| 朱锦鹏 | 郑州大学 河南省资源与材料工业技术研究院, 郑州 450001;郑州大学 中原关键金属实验室, 郑州 450001 |
| 庆宇斌 | 郑州大学 中原关键金属实验室, 郑州 450001 ;郑州大学 材料科学与工程学院, 郑州 450001 |
| 李庆奎 | 郑州大学 河南省资源与材料工业技术研究院, 郑州 450001;郑州大学 中原关键金属实验室, 郑州 450001 ;郑州大学 材料科学与工程学院, 郑州 450001 |
| 孙本双 | 郑州大学 河南省资源与材料工业技术研究院, 郑州 450001;郑州大学 中原关键金属实验室, 郑州 450001 |
| 何季麟 | 郑州大学 河南省资源与材料工业技术研究院, 郑州 450001;郑州大学 中原关键金属实验室, 郑州 450001 ;郑州大学 材料科学与工程学院, 郑州 450001 |
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| Author | Institution |
| LI Yu-jing | Henan Province Industrial Technology Research Institute of Resources and Materials,Zhengzhou 450001, China ;Zhongyuan Critical Metals Laboratory,Zhengzhou 450001, China |
| YANG Kai-jun | Henan Province Industrial Technology Research Institute of Resources and Materials,Zhengzhou 450001, China ;Zhongyuan Critical Metals Laboratory,Zhengzhou 450001, China ;School of Materials Science and Engineering, Zhengzhou University, Zhengzhou 450001, China |
| ZHU Jin-peng | Henan Province Industrial Technology Research Institute of Resources and Materials,Zhengzhou 450001, China ;Zhongyuan Critical Metals Laboratory,Zhengzhou 450001, China |
| QING Yu-bin | Zhongyuan Critical Metals Laboratory,Zhengzhou 450001, China ;School of Materials Science and Engineering, Zhengzhou University, Zhengzhou 450001, China |
| LI Qing-kui | Henan Province Industrial Technology Research Institute of Resources and Materials,Zhengzhou 450001, China ;Zhongyuan Critical Metals Laboratory,Zhengzhou 450001, China ;School of Materials Science and Engineering, Zhengzhou University, Zhengzhou 450001, China |
| SUN Ben-shuang | Henan Province Industrial Technology Research Institute of Resources and Materials,Zhengzhou 450001, China ;Zhongyuan Critical Metals Laboratory,Zhengzhou 450001, China |
| HE Ji-lin | Henan Province Industrial Technology Research Institute of Resources and Materials,Zhengzhou 450001, China ;Zhongyuan Critical Metals Laboratory,Zhengzhou 450001, China ;School of Materials Science and Engineering, Zhengzhou University, Zhengzhou 450001, China |
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| 中文摘要: |
| 靶材是磁控溅射沉积薄膜的原材料，其生产朝着尺寸大型化、高纯度和高利用率等方向发展，目前靶材的主要制备方法从工艺和经济效益上难以满足其生产要求, 等离子喷涂制备靶材是解决上述问题的有效方法之一。通过分析靶材对镀膜性能的影响，总结了靶材制备的技术要求，如纯度、致密度、晶粒尺寸及一致性等。介绍了制备靶材常用的熔融铸造法、粉末冶金法和等离子喷涂法的优点和缺点。熔融铸造法可制备高纯度金属靶材，但是靶材晶粒易粗大;粉末冶金法可制备难熔金属及陶瓷靶材，但是靶材的致密度较低，制作工艺繁琐。这2种方法都难以制作大尺寸靶材。针对等离子喷涂技术在制造靶材方面易于实现大尺寸及管状靶材的制备，并且具有生产工序简单、成本低和可实现废靶修复再利用等特点，重点综述了等离子喷涂制备金属靶材、陶瓷靶材、合金靶材和修复残靶等方面的研究现状。分析认为，喷涂参数、喷涂环境、原料状态、掺杂元素和喷涂后处理等因素是影响靶材性能的关键。通过合理选择喷涂工艺参数，能够实现粉末持续保持熔融状态和充足动量，涂层应力充分释放，以及形成良好的微观组织等方面的协同效果，进一步提升喷涂靶材的纯度和致密度等方面的性能。最后针对等离子喷涂制备靶材的特点，对未来的研究方向进行了展望。 |
| 英文摘要: |
| The sputtering target is the raw material of magnetron sputtering to prepare the thin film. The target has several development directions in industrial production, including large size, high purity, and high utilization. Due to the circular magnetic field generated by the circular permanent magnet on the surface of the target, the target will produce uneven erosion. The actual utilization rate of the tabular target is only 20%-35%, but the real utilization rate of the circular target is 80%. The size of the target also determines the efficiency of production. Although the main preparation methods of the target have been developed for several years, they are challenging to manufacture the large size and rotary target in terms of technology and economic benefits. In this work, the basic technical requirements of target preparation were summarized duo to the performance of targets as an essential role in preparing the thin film, such as purity, density, texture, grain size, and uniformity of grain distribution. The characteristics of melt casting, powder metallurgy, and plasma spraying were introduced. The target with ultra-purity can be prepared by melt casting, but production is of the characteristics of the complex process, high energy consumption, and target with coarse grain. Powder metallurgy can produce alloy and oxide targets at a relatively low cost, but the target has high porosity and low purity. Plasma spraying has been developed into technology for preparing the target from a well-established coating technology, which can easily make large size targets and tubular targets with various kinds of raw materials required. In addition, plasma spraying also has the characteristics of simple production, low cost, waste target repair and reuse in preparing targets. The research progress on preparing the target of metal, ceramic, and alloy and repairing residual targets by plasma spraying is reviewed. However, the target prepared by plasma spraying has some problems, such as high porosity, low density, and discontinuous microstructure. The pores in the target can be divided into three types:lamellar pores with incomplete interparticle bonding, high-temperature droplets that absorb gas during flight and form spherical holes after cooling, and microcracks in the vertical direction are caused by stress during cooling. The porosity of the tissue dramatically limits the development of plasma spraying preparation of sputtering targets. The target can only be used when the target density requirements are not very strict, such as mobile phones, hardware, architecture, energy-saving glass, etc. All the factors, including spraying parameters, spraying environment, raw material state, doping elements, and coating post-treatment, are the primary factors that affect the target performance. Moreover, it analyzes how these factors act and how to avoid or utilize them. Through the reasonable selection of spraying process parameters, the powder keeps melting state and sufficient momentum, coating stress release, and good formation of internal microstructure. Furthermore, the purity and density of the spraying target can be further improved. It aims at the features of preparing the target by plasma spraying and the future research direction is prospected. |
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