司彪,时晓光,孙琳凡,杜峰,张开策,周艳文.Ti6Al4V表面增强CrN和TiN薄膜[J].表面技术,2023,52(7):444-454.
SI Biao,SHI Xiao-guang,SUN Lin-fan,DU Feng,ZHANG Kai-ce,ZHOU Yan-wen.CrN and TiN Films Enhanced Surface Strength of Ti6Al4V Alloy[J].Surface Technology,2023,52(7):444-454 |
| Ti6Al4V表面增强CrN和TiN薄膜 |
| CrN and TiN Films Enhanced Surface Strength of Ti6Al4V Alloy |
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| DOI：10.16490/j.cnki.issn.1001-3660.2023.07.041 |
| 中文关键词: TC4钛合金 等离子体增强磁控溅射 等离子体密度 氮化物薄膜 低载荷摩擦 |
| 英文关键词:TC4 titanium alloy plasma enhanced magnetron sputtering plasma density nitride film, low load friction |
| 基金项目:国家自然科学基金(51972155，52271056);辽宁省教育厅项目基金(LJKZ0278，LJKZ0306);海洋工程金属材料装备及应用国家重点实验室项目(HGSKL-UST LN (2020-05)) |
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| Author | Institution |
| SI Biao | Research Institute of Surface Engineering, School of Materials and Metallurgy, Liaoning Anshan 114051, China |
| SHI Xiao-guang | Automobile & Home Application Steel Institute, Iron & Steel Research Institution, Ansteel Group, Liaoning Anshan 114021, China |
| SUN Lin-fan | Research Institute of Surface Engineering, School of Materials and Metallurgy, Liaoning Anshan 114051, China |
| DU Feng | Research Institute of Surface Engineering, School of Materials and Metallurgy, Liaoning Anshan 114051, China |
| ZHANG Kai-ce | School of Chemical Engineering, University of Science and Technology Liaoning, Liaoning Anshan 114051, China |
| ZHOU Yan-wen | Research Institute of Surface Engineering, School of Materials and Metallurgy, Liaoning Anshan 114051, China |
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| 中文摘要: |
| 目的 研究表面增强氮化铬(CrN)和氮化钛(TiN)薄膜与Ti6Al4V(TC4)基体的适应性。方法 采用热丝增强等离子体磁控溅射技术，通过改变热丝放电电流，在TC4合金表面制备CrN、TiN薄膜。采用扫描电子显微镜、X–射线衍射仪、纳米压痕仪、洛氏硬度计和摩擦磨损测试仪分别表征薄膜的组织形貌、成分、相结构、内应力、纳米硬度、弹性模量及耐磨性。结果 随着热丝放电电流从0 A增加至32 A，等离子体密度增大，薄膜表面形貌由较疏松的四棱锥形转变成致密球形，截面柱状晶排列更加致密;薄膜择优取向从低应变能的(111)取向转变为低表面能的(200)取向;无热丝放电时TiN薄膜内应力高于CrN薄膜，随着热丝放电电流的增大，TiN薄膜内应力逐渐低于CrN薄膜;并且随着热丝放电电流的增大，薄膜的弹性模量与硬度均增大，但相同试验条件下CrN薄膜的弹性模量与硬度均低于TiN薄膜;压痕检测结果表明，薄膜与基体结合完好;低载荷摩擦磨损检测结果表明，硬度及弹性模量较高的TiN薄膜磨损量最低。结论 在相同等离子体密度能量轰击下，硬度和弹性模量较高的TiN薄膜内应力增幅较小;低载荷磨损时，弹性模量及硬度较高、内应力较低的TiN薄膜更适用于Ti6Al4V基体的增强改性。 |
| 英文摘要: |
| Hot wire enhanced plasma magnetron sputtering technique (PEMS) is based on the traditional magnetron sputtering assisting by tungsten wires as an electron source to enhance greatly the plasma density. The growing film is going to be bombarded by high-density ions, which significantly improve the film's density and adhesion. Chromium nitride (CrN) and titanium nitride (TiN) films were prepared on the surface of Ti6Al4V (TC4) alloy by this PEMS. The adaptabilities of the CrN and TiN films to TC4 matrix were studied. The TC4 matrix with a thickness of 3 mm and a length and width of 15 mm was polished, alcohol cleaned and dried before set into the vacuum chamber for plasma bombarded to further inside cleaning. The CrN and TiN films were deposited on the TC4 matrix only by varying the hot wire discharge current from 0 A to 16 A and 32 A, respectively. The surface and cross-sectional morphology were observed by SIGMA HD field emission electron microscope, and the element content was measured. An X' pert Powder X-ray diffractometer was used for phase analysis, with a scanning range of 20°-100°, scanning time of 8 min, and 0.03 (°)/step. The internal stress of the film was calculated by sin2ψ method, whose ψ deviation was based on the Grazing Incidence X-Ray Diffraction (GIXRD) test. Each film's thickness was measured by an Alpha-step D-100 profilometer. A G200 nano indentation tester was used to measure the nano hardness and elastic modulus of the matrix and films. A Rockwell hardness tester with a load of 1 470 N was used to test the adhesion by judging the failure edge of the indentation. The friction and wear properties of the films were evaluated by a MS-T3001 friction and wear tester. The results showed that the surface morphology of the films changed from loose pyramid to dense sphere and the columns got compact. The preferred orientations of the films changed from (111) with low strain energy to (200) with low surface energy, as the increase of hot wire discharge currents from 0 A to 32 A, i.e., the increases of the plasma density. Without assisting of the discharge current, the internal stress of the TiN film was higher than that of the CrN film. With the increase of the discharge currents, the increases of internal stresses of TiN films were much slow than those of the CrN films. As a result, the internal stresses of the TiN films became lower than those of the CrN films as the discharge currents increased. The nano-hardness and modulus of the CrN films were lower than those of TiN films, although they increased with the discharge currents. Indentation test showed that the films were well bonded to the matrix. The low load friction and wear test showed that the wear losses of TiN films with high hardness and modulus were the lowest. In conclusion, the increase of internal stress in TiN film with higher hardness and modulus is relatively low, and the TiN film with high modulus and hardness and low internal stress is more suitable for the modification of Ti6Al4V matrix under relatively low wear load of 2.94 N. |
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