刘勇,苏峰华,孙建芳,李助军,刘怡飞.MoS2-Ti自润滑复合薄膜的高温摩擦学性能研究[J].表面技术,2022,51(2):20-28.
LIU Yong,SU Feng-hua,SUN Jian-fang,LI Zhu-jun,LIU Yi-fei.Tribological Properties of MoS2-Ti Self-lubricating Composite Film at High Temperature[J].Surface Technology,2022,51(2):20-28 |
| MoS2-Ti自润滑复合薄膜的高温摩擦学性能研究 |
| Tribological Properties of MoS2-Ti Self-lubricating Composite Film at High Temperature |
| 投稿时间：2021-10-26 修订日期：2022-01-21 |
| DOI：10.16490/j.cnki.issn.1001-3660.2022.02.002 |
| 中文关键词: 磁控溅射 MoS2-Ti复合薄膜 高温 摩擦学性能 磨损机制 |
| 英文关键词:magnetron sputtering MoS2-Ti composite films high temperature tribological properties wear mechanism |
| 基金项目:国家自然科学基金(52175168);广东省自然科学基金(2021A1515012266);2020年广东省普通高校创新团队项目(2020KCXTD043);2020年广东省普通高校重点领域(智能制造)(2020ZDZX2089) |
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| Author | Institution |
| LIU Yong | School of Mechanical and Automotive Engineering, South China University of Technology, Guangzhou 510641, China |
| SU Feng-hua | School of Mechanical and Automotive Engineering, South China University of Technology, Guangzhou 510641, China |
| SUN Jian-fang | School of Mechanical and Automotive Engineering, South China University of Technology, Guangzhou 510641, China |
| LI Zhu-jun | School of Electromechanical Engineering, Guangzhou Railway Polytechnic, Guangzhou 510430, China |
| LIU Yi-fei | School of Electromechanical Engineering, Guangzhou Railway Polytechnic, Guangzhou 510430, China |
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| 中文摘要: |
| 目的 探究Ti含量对MoS2-Ti复合薄膜高温摩擦学性能的影响，制备高温摩擦性能良好的MoS2-Ti复合薄膜。方法 采用射频和直流双靶共溅射技术沉积了不同Ti含量的MoS2-Ti复合薄膜，研究了Ti含量对MoS2-Ti薄膜微观结构和力学性能的影响，进一步探究了MoS2-Ti复合薄膜在大气环境下的高温摩擦学性能。采用能谱仪(EDS)、X射线衍射仪(XRD)和扫描电子显微镜(SEM)，对薄膜的成分、晶相结构及微观形貌进行分析。利用显微维氏硬度计测试薄膜的力学性能，通过UMT-TriboLab摩擦磨损试验机评价薄膜的摩擦磨损性能。此外，采用SEM、拉曼光谱仪(Raman)和X射线光电子能谱仪(XPS)，对薄膜的磨痕形貌及对偶球转移膜的成分进行分析。结果 Ti掺杂促进了MoS2薄膜以(002)晶面择优取向生长，且提高了薄膜的致密度，薄膜硬度从70HV提升到350HV。MoS2-Ti复合薄膜在高温环境下的摩擦性能，随Ti含量的增加呈先上升后下降的趋势，其中Ti原子数分数为6.81%的MoS2-Ti复合薄膜具有较低的摩擦因数和磨损率。通过对转移膜的成分进行分析，发现处于300 ℃高温环境下，Ti原子数分数为13.51%的MoS2-Ti复合薄膜由于在摩擦过程中生成的氧化物较多，其耐磨性能开始下降。结论 Ti含量对MoS2-Ti复合薄膜的高温摩擦学性能有明显的影响，掺杂适量Ti能显著提高MoS2 薄膜在大气环境下的高温摩擦学性能。 |
| 英文摘要: |
| This paper aims to explore the effect of Ti content on the tribological properties of MoS2-Ti composite films at high temperature, and prepare MoS2-Ti self-lubricating composite film with good friction properties at high temperature. The MoS2-Ti composite films with different Ti contents were deposited by radio frequency and direct-current dual-target co-sputtering techniques. The effects of Ti content on the microstructures, mechanical properties and tribological behaviors at high temperature of the MoS2-Ti composite films were investigated. The composition, crystal phase structure and microstructure of the films were analyzed by energy dispersive spectroscopy (EDS), X-ray diffraction (XRD) and scanning electron microscopy (SEM). A microhardness tester was applied to evaluate the mechanical properties of the MoS2-Ti composite films. UMT-TriboLab tribotest was employed to evaluate the tribological properties of MoS2-Ti composite films. Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) were used to further analyze the wear surface of the films and the composition of the transfer films on the counterparts. The results showed that Ti doping promoted the growth of the MoS2-Ti composite films in the preferred orientation of (002) crystal plane, and improved the density of the film. The hardness of the film increased from 70HV to 350HV as Ti doping into MoS2. The tribological properties of the MoS2-Ti composite films at high temperature increased firstly and then decreased with the increase of Ti content, and the MoS2-Ti composite films with Ti content of 6.81at.% possessed the best tribological properties. By analyzing the composition of the transfer film, it was found that the wear resistance of the MoS2-Ti composite films with Ti content of 13.51at.% began to decline at 300 ℃ due to more oxides generated during the sliding process. The tribological properties of the MoS2-Ti composite films at high temperature were greatly affected by the Ti content, and appropriate Ti doping could significantly improve the tribological properties of the MoS2 films at high temperature in atmospheric environment. |
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