魏永强,游业豪,蒋志强.脉冲偏压频率对TiSiN/TiAlN纳米多层膜结构和性能的影响规律[J].表面技术,2021,50(12):311-319.
WEI Yong-qiang,YOU Ye-hao,JIANG Zhi-qiang.Effects of Pulse Bias Frequency on the Microstructure andProperties of TiSiN/TiAlN Nano-Multilayer Films[J].Surface Technology,2021,50(12):311-319 |
| 脉冲偏压频率对TiSiN/TiAlN纳米多层膜结构和性能的影响规律 |
| Effects of Pulse Bias Frequency on the Microstructure andProperties of TiSiN/TiAlN Nano-Multilayer Films |
| 投稿时间：2021-06-07 修订日期：2021-09-27 |
| DOI：10.16490/j.cnki.issn.1001-3660.2021.12.030 |
| 中文关键词: 电弧离子镀 纳米多层膜 TiSiN/TiAlN 脉冲偏压频率 纳米硬度 |
| 英文关键词:arc ion plating nano multilayer film TiSiN/TiAlN pulsed bias frequency nano hardness |
| 基金项目:国家自然科学基金(51401182);航空科学基金(2016ZE55013);河南省高等学校重点科研项目指导计划(22B430030) |
| 作者 | 单位 |
| 魏永强 | 郑州航空工业管理学院 航空工程学院，郑州 450015 |
| 游业豪 | 郑州航空工业管理学院 航空工程学院，郑州 450015 |
| 蒋志强 | 郑州航空工业管理学院 航空工程学院，郑州 450015 |
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| Author | Institution |
| WEI Yong-qiang | School of Aeronautics and Astronautics, Zhengzhou University of Aeronautics, Zhengzhou 450015, China |
| YOU Ye-hao | School of Aeronautics and Astronautics, Zhengzhou University of Aeronautics, Zhengzhou 450015, China |
| JIANG Zhi-qiang | School of Aeronautics and Astronautics, Zhengzhou University of Aeronautics, Zhengzhou 450015, China |
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| 中文摘要: |
| 目的 研究脉冲偏压频率对TiSiN/TiAlN纳米多层薄膜结构和性能的影响，优化工艺参数，以提高薄膜的性能。方法 采用脉冲偏压电弧离子镀，在M2高速钢和单晶硅基底上以不同脉冲偏压频率沉积TiSiN/TiAlN纳米多层薄膜，采用扫描电子显微镜(SEM)、能谱仪(EDS)、X射线衍射仪和纳米压痕仪，研究脉冲偏压频率对TiSiN/TiAlN纳米多层薄膜的表面形貌、元素成分、截面形貌、相结构和纳米硬度的影响。结果 TiSiN/TiAlN纳米多层薄膜表面的大颗粒直径主要集中在1 μm以下，随着脉冲偏压频率的变化，大颗粒的数量为184~234，所占面积为40.686~63.87 μm2;主要元素为Ti元素和N元素，所占原子比分别为48%和50%，Si和Al元素的含量较少;多层结构不明显，截面形貌可观察到柱状晶的细化，80 kHz时出现片状化结构;以(111)晶面为择优取向，晶粒尺寸在20 nm左右;纳米硬度为28.3~32.3 GPa，弹性模量为262.5~286.8 GPa。结论 50 kHz时，TiSiN/TiAlN纳米多层薄膜表面大颗粒的数量最少，为184个;70 kHz时大颗粒所占面积最小，为40.686 μm2;晶粒尺寸在50~60 kHz时发生细化，60 kHz时，晶粒尺寸达到最小值19.366 nm，纳米硬度和弹性模量分别达到最大值32.3 GPa和308.6 GPa，脉冲偏压频率的最佳频率范围为50~70 kHz。 |
| 英文摘要: |
| Effects of the pulse bias frequency on the microstructure and properties of TiSiN/TiAlN nano-multilayer films were investigated for optimizing the process parameters and improving the performances. The TiSiN/TiAlN nano-multilayer film were deposited by arc ion plating technology with defferent pulse bias frequency on M2 high-speed steel and monocrystalline silicon substrates. The surface morphology, element composition, cross-section morphology, phase structure and nanohardness of the TiSiN/TiAlN nano-multilayer films were investigate by scanning electron microscope (SEM), energy spectrometer (EDS), X-ray diffractometer and nanoindenter. The diameter of the macroparticles on the surface of the TiSiN/TiAlN nano-multilayer film was mainly concentrated below 1 μm. With the change of the pulse bias frequency, the number of macroparticles was 184~234, and the area was 40.686~63.87 μm2. The main elements of TiSiN/TiAlN nano-multilayer films were Ti and N, which reached to 48% and 50%, respectively. The contents of Si and Al were small. The multilayer structure was not obvious from the cross-sectional morphology, and columnar crystals of TiSiN/TiAlN nano-multilayer films refined. Flaky structure of the crystals appeared at 80 kHz. The TiSiN/TiAlN nano-multilayer films were crystallized with preferred orientation (111) crystallographic planes. The grain size was about 20 nm. The nano hardness was between 28.3~32.3 GPa, and the elastic modulus was between 262.5~286.8 GPa. The number of macroparticles on the surface of the TiSiN/TiAlN nano-multilayer films reached the minimium 184 at 50 kHz. The area occupied by macroparticles reached the minimium 40.686 μm2 at 70 kHz. the grain size was refined at 50~60 kHz. The grain size reached the minimum value of 19.366 nm at 60 kHz. The nano-hardness and the elastic modulus reached the maximum values of 32.3 GPa and 308.6 GPa, respectively. 50~70 kHz was the best the pulse bias frequency range. |
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