缪跃琼,王旭,邓乾发,周文慧,毛越初,黄林彬,袁巨龙.介电泳辅助水溶解抛光过程中微水滴分布的仿真与实验研究[J].表面技术,2021,50(10):373-383.
MIAO Yue-qiong,WANG Xu,DENG Qian-fa,ZHOU Wen-hui,MAO Yue-chu,HUANG Lin-bin,YUAN Ju-long.Simulation and Experimental Research on the Distribution of Water Droplets in Dielectrophoresis-assisted Water Disdissdution Polishing Process[J].Surface Technology,2021,50(10):373-383 |
| 介电泳辅助水溶解抛光过程中微水滴分布的仿真与实验研究 |
| Simulation and Experimental Research on the Distribution of Water Droplets in Dielectrophoresis-assisted Water Disdissdution Polishing Process |
| 投稿时间：2021-01-22 修订日期：2021-04-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2021.10.039 |
| 中文关键词: 介电泳效应 KDP晶体 水溶解抛光 电极形状 表面粗糙度 材料去除率 |
| 英文关键词:dielectrophoresis effect KDP crystal water dissdution polishing electrode shape surface roughness material removal rate |
| 基金项目:国家自然科学基金项目(51805485，51775511);浙江省自然科学基金项目(LY21E050010);中国博士后科学基金项目(2019M652138) |
| 作者 | 单位 |
| 缪跃琼 | 浙江工业大学 a.机械工程学院 b.特种装备制造与先进加工技术教育部重点实验室，杭州 310014 |
| 王旭 | 浙江工业大学 a.机械工程学院 b.特种装备制造与先进加工技术教育部重点实验室，杭州 310014 |
| 邓乾发 | 浙江工业大学 a.机械工程学院 b.特种装备制造与先进加工技术教育部重点实验室，杭州 310014 |
| 周文慧 | 杭州汽轮机股份有限公司，杭州 310022 |
| 毛越初 | 浙江工业大学 a.机械工程学院 b.特种装备制造与先进加工技术教育部重点实验室，杭州 310014 |
| 黄林彬 | 浙江工业大学 a.机械工程学院 b.特种装备制造与先进加工技术教育部重点实验室，杭州 310014 |
| 袁巨龙 | 浙江工业大学 a.机械工程学院 b.特种装备制造与先进加工技术教育部重点实验室，杭州 310014 |
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| Author | Institution |
| MIAO Yue-qiong | a.College of Mechanical Engineering, b.Key Laboratory of Special Purpose Equipment and Advanced Manufacturing Technology, Ministry of Education, Zhejiang University of Technology, Hangzhou 310014, China |
| WANG Xu | a.College of Mechanical Engineering, b.Key Laboratory of Special Purpose Equipment and Advanced Manufacturing Technology, Ministry of Education, Zhejiang University of Technology, Hangzhou 310014, China |
| DENG Qian-fa | a.College of Mechanical Engineering, b.Key Laboratory of Special Purpose Equipment and Advanced Manufacturing Technology, Ministry of Education, Zhejiang University of Technology, Hangzhou 310014, China |
| ZHOU Wen-hui | Hangzhou Steam Turbine Co.Ltd., Hangzhou 310022, China |
| MAO Yue-chu | a.College of Mechanical Engineering, b.Key Laboratory of Special Purpose Equipment and Advanced Manufacturing Technology, Ministry of Education, Zhejiang University of Technology, Hangzhou 310014, China |
| HUANG Lin-bin | a.College of Mechanical Engineering, b.Key Laboratory of Special Purpose Equipment and Advanced Manufacturing Technology, Ministry of Education, Zhejiang University of Technology, Hangzhou 310014, China |
| YUAN Ju-long | a.College of Mechanical Engineering, b.Key Laboratory of Special Purpose Equipment and Advanced Manufacturing Technology, Ministry of Education, Zhejiang University of Technology, Hangzhou 310014, China |
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| 中文摘要: |
| 目的 为解决KDP晶体无损表面的制造难题，进一步提升水溶解抛光方法的抛光质量和效率，研究介电泳效应对水溶解抛光液的影响。方法 提出一种介电泳辅助水溶解的抛光方法，最终获得超光滑表面，采用有限元软件模拟极化后微水滴的运动行为，并搭建验证性平台观测介电泳力作用下抛光液的吸附行为，验证抛光原理。之后数值模拟不同的电极形状对微水滴受到介电泳力的影响规律，优化得到最优电极形状参数。最后搭建试验平台，验证介电泳对水溶解抛光效率和质量的提升效果。结果 微水滴会在介电泳力作用下发生形变，并聚集在晶体表面附近，从而提高抛光过程中参与溶解的微水滴数量，加快溶解去除速率。同时，上电极也会对抛光液产生“吸附”作用，延长抛光液在晶体表面的作用时间，减小抛光液甩出率，进一步提高抛光效率。双螺旋结构电极具有最大的电场梯度，能够使水滴受到最大的介电泳力而向晶体表面聚集。经过20 min抛光后，采用传统水溶解抛光的KDP晶体表面粗糙度Ra由抛光前的590 nm降低至1.637 nm，而采用介电泳辅助水溶解抛光的KDP晶体，表面粗糙度降至1.365 nm，表面质量更高。与传统水溶解抛光相比，介电泳辅助水溶解抛光效率提升24%，同时能够更快地获得光滑表面。结论 在介电泳效应的辅助作用下，KDP晶体水溶解抛光质量和效率均得到了提升。 |
| 英文摘要: |
| To solve the issue of non-destructive surface manufacturing of KDP crystal and further improve the polishing quality and efficiency of the water dissdution polishing method, the influence of dielectrophoresis on the water dissdution polishing slurry is studied. The polishing method of dielectrophoretic assisted water dissdution is proposed, and finally, an ultra-smooth surface is obtained. The motion behavior of the polarized droplets was simulated by the software of finite element analysis in this paper. To verify the polishing principle, the verification platform to observe the adsorption behavior of the slurry under the action of dielectrophoresis force was built. Through the numerical simulation, the influence of different electrode shapes on the dielectrophoresis force of micro-droplets was studied, and the optimal electrode shape parameters were obtained. A test platform was built to verify the efficiency and quality improvement effects of dielectrophoresis on the water dissdution polishing. The analysis of the motion behavior of the water dissdution polishing slurry and the micro-droplets in it show that:the micro water droplets were deformed under the action of dielectrophoresis force and gather near the crystal surface, thereby the number of micro-droplets involved in disdissdution during polishing was increased and the removal rate was increased; at the same time, slurry was adsorbed by the upper electrode to prolong the action time of the slurry on the crystal surface, the slurry rejection rate was reduced, and further, the polishing efficiency was improved; the double-helical structure electrode has the largest electric field gradient, which can make the water droplets receive the largest dielectrophoretic force and gather on the crystal surface. The polishing experiment results show that:after polishing for 20 minutes, the surface roughness of KDP crystal by the traditional water dissdution polishing was reduced from Ra 590 nm to 1.637 nm, while the surface roughness of KDP crystal by the dielectrophoresis assisted water dissdution polishing was reduced to 1.365 nm. Compared with water dissdution polishing, the efficiency of dielectrophoresis assisted water dissdution polishing with double spiral electrode arrangement was increased by 24%, and a smooth surface can be obtained faster. With the aid of the dielectrophoresis effect, the quality and efficiency of KDP crystal water dissdution polishing are improved. |
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