李大玉,代书雨,张燕军,张徐,张章.TiSiO非晶结构光学薄膜的性能调控机理研究进展[J].表面技术,2018,47(12):83-91.
LI Da-yu,DAI Shu-yu,ZHANG Yan-jun,ZHANG Xu,ZHANG Zhang.Research Progress for Regulation Mechanism of TiSiO Amorphous Structure Optical Films[J].Surface Technology,2018,47(12):83-91 |
| TiSiO非晶结构光学薄膜的性能调控机理研究进展 |
| Research Progress for Regulation Mechanism of TiSiO Amorphous Structure Optical Films |
| 投稿时间：2018-03-06 修订日期：2018-12-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2018.12.012 |
| 中文关键词: TiSiO 非晶结构 光学薄膜 制备工艺 溶胶-凝胶 物理气相沉积 化学气相沉积 |
| 英文关键词:TiSiO amorphous structure optical films sol-gel physical vapour deposition chemical vapour deposition |
| 基金项目:国家自然科学基金（51602279）；江苏省博士后科研资助计划项目（1601048B）；江苏省高校优秀中青年教师和校长赴境外研修项目（2017-170）； 扬州大学高端人才和青蓝工程支持计划（2018） |
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| Author | Institution |
| LI Da-yu | School of Mechanical Engineering, Yangzhou University, Yangzhou 225127, China |
| DAI Shu-yu | School of Mechanical Engineering, Yangzhou University, Yangzhou 225127, China |
| ZHANG Yan-jun | School of Mechanical Engineering, Yangzhou University, Yangzhou 225127, China |
| ZHANG Xu | School of Mechanical Engineering, Yangzhou University, Yangzhou 225127, China |
| ZHANG Zhang | School of Mechanical Engineering, Yangzhou University, Yangzhou 225127, China |
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| 中文摘要: |
| TiSiO复合薄膜的制备方法主要包括溶胶-凝胶、物理气相沉积和化学气相沉积等，针对不同制备工艺条件下SiO2改性TiO2的微观结构与光学参量的调控机理的研究，仍处于探索阶段。综述了近年来国内外在不同工艺条件下沉积的TiSiO薄膜的结构和光学性质，从溶胶体系和热处理工艺两方面，对溶胶-凝胶工艺制备的TiSiO薄膜展开论述，分别归纳了溶胶体系和热处理工艺调控TiSiO薄膜的结构和光学性质的一般规律；从溅射工艺和蒸发工艺两方面对物理气相沉积工艺制备的TiSiO薄膜展开论述，分别阐述了在溅射工艺和蒸发工艺过程中，调控TiSiO薄膜的结构和光学性质的一般规律；从低（常）压化学气相沉积和等离子增强化学气相沉积等方面，对化学气相沉积工艺制备的TiSiO薄膜展开论述，分别阐述了在不同化学气相沉积技术中，通过调节一些重要参数调控薄膜结构和性能的一般规律。总结了不同工艺制备并调控TiSiO薄膜的一般规律的内在联系，并指出了这类薄膜制备工艺存在的问题和后续的研究方向。 |
| 英文摘要: |
| The preparation methods of TiSiO composite thin films mainly include sol-gel, physical vapour deposition, chemical vapour deposition processes, etc. However, the research concerning the regulation mechanism on the microstructures and optical constants for TiO2 doped with SiO2 under different growth conditions is still in the stage of exploration. The structural and optical properties of TiSiO films fabricated under different deposition conditions at home and abroad in recent years were summarized: TiSiO films prepared by sol-gel processes were mainly influenced by two parameters including sol system and heat treatment, and the general laws governing the structures and optical properties of TiSiO films mediated by sol systems and heat treatment processes were summarized respectively. The TiSiO films deposited by physical vapor deposition (PVD) methods including sputtering and evaporation were also studied, and the general rules governing the structures and optical properties of TiSiO films during the PVD processes were described. The TiSiO films grown by chemical vapor deposition (CVD) which consists of low (or atmospheric) pressure chemical vapor deposition and plasma enhanced chemical vapor deposition were investigated, and the general rules to control the structures and optical properties of these films by adjusting some important parameters in different CVD techniques were described. The intrinsic connections between the preparation methods and the regula-tion rules for TiSiO film structures and properties are summarized and the problems existing in the preparation of such thin films and the subsequent research directions are pointed out. |
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