张栋,陈仁德,智理,柯培玲,汪爱英.高透光氧化硅涂层的低温制备及微观结构调整[J].表面技术,2018,47(8):51-57.
ZHANG Dong,CHEN Ren-de,ZHI Li,KE Pei-ling,WANG Ai-ying.Low Temperature Preparation and Microstructure Adjustment of High Transmittance Silicon Oxide Coatings[J].Surface Technology,2018,47(8):51-57 |
| 高透光氧化硅涂层的低温制备及微观结构调整 |
| Low Temperature Preparation and Microstructure Adjustment of High Transmittance Silicon Oxide Coatings |
| 投稿时间：2018-03-15 修订日期：2018-08-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2018.08.008 |
| 中文关键词: 氧化硅涂层 功能装饰 透光性 力学性能 |
| 英文关键词:silicon oxide coatings functional decoration optical transmittance mechanical properties |
| 基金项目:宁波市工业重点项目（2017B10042）；慈溪市工业科技计划项目（2015A07） |
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| Author | Institution |
| ZHANG Dong | Key Laboratory of Marine Materials and Related Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China |
| CHEN Ren-de | Key Laboratory of Marine Materials and Related Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China |
| ZHI Li | Ningbo GENSEN Auto Parts Co., Ltd, Cixi 315300, China |
| KE Pei-ling | Key Laboratory of Marine Materials and Related Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China |
| WANG Ai-ying | Key Laboratory of Marine Materials and Related Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China |
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| 中文摘要: |
| 目的 提供一种在真空装饰领域能够广泛应用的具有防护、功能性的氧化硅涂层制备方法，为具体应用中涂层工艺参数的选择提供指导。方法 采用 PECVD 技术，通过改变 O2与 HMDSO 配比，低温制备具有不同微结构的氧化硅涂层。采用扫描电镜观察涂层的表截面微观形貌，采用 X 射线衍射仪、傅里叶变换红外光谱仪、X 射线光电子能谱仪、激光共聚焦拉曼光谱仪分析涂层的微结构及成分，采用紫外分光光度计表征涂层透光性，采用纳米压痕仪表征涂层的力学性能，采用接触角仪表征涂层的表面润湿性。结果 所制备的氧化硅涂层表面光滑，结构致密。随反应气体中 O2配比的增加，涂层结构由 SiO 逐渐过渡为 SiO2，并掺杂有少量非晶碳，其光学透过率增加，力学性能下降，亲水性增加。当碳含量最低时，涂层具有最优异的透光性及最好的亲水性，在全可见光波段范围内透过率接近 100%，与水接触角为 45.38°；当碳含量最高时，涂层具有最优异的力学性能，硬度为 13.5 GPa，H/E 为 0.11。结论 采用 PECVD 方法能够在低温下获得光学透明、具有一定硬度、表面易清洁的氧化硅涂层，通过气体控制能够对涂层微结构及性能进行调节，从而适用于不同需求的功能装饰。 |
| 英文摘要: |
| The work aims to provide a method for preparing protective and functional silicon oxide coatings which can be widely applied in the field of vacuum decoration, and provide guidance for selecting coating process parameters in specific applications. Silicon oxide coatings with different microstructures were prepared at low temperature by changing O2/HMDSO ratio adopting PECVD technology. Surface and sectional morphology of the coatings was observed by scanning electron microscope. Microstructures and composition of the coatings were analyzed by X-ray diffractometer, Fourier transform infrared spectroscopy, X ray photoelectron spectroscopy and Raman spectrum. Optical transmittance of the coatings was characterized by UV spectrophotometer. Mechanical properties and wettability of the coatings were characterized by nanoindentor and contact angle meter, respectively. The coatings had smooth surface and compact structure. With the increase of oxygen flow ratio in reaction gas, the coating structure gradually transformed from SiO to SiO2, and a small amount of amorphous carbon structure existed, optical transmittance and hydrophilicity increased while mechanical properties decreased. When the carbon content was the lowest, the coatings exhibited the best transmittance and hydrophilicity, the transmittance in the whole visible light waveband was nearly 100%, and water-coating contact angle was 45.38°. When the carbon content was the highest, the coating exhibited the best mechanical properties, hardness was 13.5 GPa, and H/E was 0.11. PECVD can be used to obtain optically transparent silicon oxide coatings which feature in high hardness and surface cleaning convenience at low temperature. Microstructure and properties of the coatings can be adjusted through as control, so that the coatings can be applied to functional decoration applications which propose different requirements. |
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