张恩耀,陈云贵.离子注入对LaFe11.6Si1.4合金的缓蚀及其机理研究[J].表面技术,2017,46(2):194-198.
ZHANG En-yao,CHEN Yun-gui.Corrosion Inhibition and Mechanism of LaFe11.6Si1.4 Alloy Implanted with Ions[J].Surface Technology,2017,46(2):194-198
离子注入对LaFe11.6Si1.4合金的缓蚀及其机理研究
Corrosion Inhibition and Mechanism of LaFe11.6Si1.4 Alloy Implanted with Ions
投稿时间:2016-09-19  修订日期:2017-02-20
DOI:10.16490/j.cnki.issn.1001-3660.2017.02.032
中文关键词:  LaFe11.6Si1.4合金  形貌分析  电化学方法  离子注入  Cr2O3钝化层  腐蚀机理
英文关键词:LaFe11.6Si1.4 alloy  morphology analysis  electrochemical method  ion implantation  Cr2O3 passivation layer  corrosion mechanism
基金项目:陕西省教育厅2014年科学研究项目计划(14JK1366)
作者单位
张恩耀 西安航空职业技术学院,西安 710089 
陈云贵 四川大学,成都 610065 
AuthorInstitution
ZHANG En-yao Xi′an Aeronautical Polytechnic Institute, Xi′an 710089, China 
CHEN Yun-gui Sichuan University, Chengdu 610065, China 
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中文摘要:
      目的 通过表面Cr离子注入在LaFe11.6Si1.4合金表面生成一层具有耐蚀作用的保护层,从而提高合金的耐腐蚀性能。方法 采用表面离子注入法,分别在注入电压为20、30、40 kV,注入计量为5×1016、10×1016、50×1016 ions/cm2的条件下注入Cr离子。利用扫描电子显微镜及X-射线衍仪对合金的表面形貌、组织结构及成分进行了分析,通过电化学方法对合金表面离子注入后的耐腐蚀性进行了研究。结果 当Cr离子的注入电压为40 kV,注入剂量为5×1016、1×1017、5×1017 ions/cm2时,合金的开路电位分别是-0.585、-0.584、-0.57V(vs. SCE)。当Cr离子的注入剂量为5×1017 ions/cm2,注入电压为20、30、40 kV时,合金的开路电位分别是-0.63、-0.61、-0.57 V(vs. SCE)。可以看到,随着Cr离子注入计量和注入电压的增加,合金表面的腐蚀电位正向移动,耐腐蚀性提高。结论 Cr离子注入能够显著提高合金的耐腐蚀性,分析认为主要是由于合金表面生成了一层具有耐腐蚀性能的Cr2O3钝化层。此外,由于注入离子的轰击导致表面La(Fe,Si)13相分解生成α-Fe,也提高了合金的电极电位,增强了耐腐蚀性。
英文摘要:
      The work aims to improve the corrosion resistance of the alloy through the one anti-corrosion protective layer produced on the surface of LaFe11.6Si1.4 alloy after the Cr ion implantation. By means of surface ion implantation, Cr ions were implanted when the implantation voltages were respectively 20 kV, 30 kV and 40 kV, and the implantation dosages were 5×1016 ions/cm2, 10×1016 ions/cm2 and 50×1016 ions/cm2. Electron scanning microscope and X-ray spectroscope were used to analyze the morphology and structure as well as compositions of alloy. The corrosion resistance of alloy implanted with surface ions was studied in the electrochemical method. When the implantation voltage of Cr ion was 40 kV, the implantation dosages were 5×1016 ions/cm2, 1×1017 ions/cm2 and 5×1017 ions/cm2, respectively and the open-circuit potentials of alloy were respectively -0.585, -0.584 and -0.57 V (vs. SCE). When the implantation dosage of Cr ions was 5×1017 ions/cm2, the implantation voltages were respectively 20 kV, 30 kV and 40 kV, and the open-circuit potentials of alloy were respectively -0.63, -0.61 -0.57 V (vs. SCE). These results showed that with the increase in the implantation dosage and implantation voltage of Cr ions, the corrosion potential on the alloy surface moved in the forward direction and the corrosion resistance was improved. Conclusion The implantation of Cr ions has significantly improved the corrosion resistance of the alloy. Based on the analysis, the improved corrosion resistance is mainly attributable to the one anti-corrosion Cr2O3 passivation layer generated on the alloy surface. In addition, α-Fe from the surface phase La(Fe,Si)13 caused by the bombardment of implanted ions has also improved the electrode potential of alloy and enhanced the corrosion resistance.
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